Great success with Medusa 82 at the MNE

Allresist scored great success with Medusa 82 at the MNE 2018 conference in Copenhagen

Once again Allresist participated in the MNE with a large, attractive booth and new innovations.

As in past years, the interest of the conference participants in our diverse new developments was great. The absolute highlight however was the introduction of our Medusa 82, an excellent alternative to HSQ resists. In his talk, Dr. Tobias Mai presented the previous results which clearly demonstrate improved properties such as high process stability, extreme sensitivity enhancement and possible applications in e-beam, EUV and photolithography.

Users from all over the world subsequently inquired about the availability of Medusa. They were impressed that initial samples are immediately available and that the features of the new product Medusa 82 even exceed the good properties of HSQs (high resolution and etch stability).

Also our other innovative resists such as CSAR 62, Atlas 46, Electra 92 and the fluorescent resists were taken note of with great interest.

The congress was also used to deepen our relations with co-exhibiting partners such as SwissLitho, Raith, EVG Vistec and Heidelberg Instruments.

We would like to thank all visitors for their interest as well as the suggestions and ideas for further projects. Next year, we will be presenting our further developments at the MNE 2019 in Rhodes, Greece, and look forward to your visit.

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