Allresist participated in the conference as a “silver sponsor” with an own large stand and presented many remarkable new developments. A particular highlight was our scientific poster on our new development AR-N 4600 (now Atlas 46) and the lecture by Dr. Gerngroß about this interesting negative photoresist. Three variants of this resist are immediately available:
- 46S: equivalent to SU-8
- 46R: easily removable
- 4600-10 sensitive at g-line
Figure 1: Poster of Atlas 42
A special eye-catcher was the fluorescent structures of our new colour resists for the optical and sensor industry. On the one hand, special negative photoresists were coloured with different dyes. On the other hand, PMMA and CSAR 62 e-beam resists were mixed with fluorescent components which brightly fluoresce under UV excitation.
Figure 2: Poster of new colour resists
Other news presented on partner posters which attracted considerable attention are:
Figure 3: Poster from the University of Wuppertal – Atlas 46 as nanoimprint resist
Figure 4: Poster from the Karlsruhe Institute of Technology – Thick CSAR 62
Figure 5: Poster from the Martin-Luther University Halle – Selective three-layer system for the production of T-gates
We would like to thank you for your strong interest, your suggestions and ideas for further projects. We are particularly pleased about appreciating remarks like that of Mr Rommel of the Technical University Chalmers of Gothenburg who welcomed us with “Great, you once again have new resists in your programme”.
We are looking forward to your visit in Copenhagen next year where the MNE 2018 will take place.
