Medusa 82: Influence of post exposure bake (PEB)

The addition of photoacid generators (PAGs) can significantly increase the sensitivity of Medusa 82 (see Medusa with photoacid generator). Another option is to add a PEB after e-beam exposure. Even if substrates were previously stored for several days, the sensitivity significantly increases depending on the temperature and the duration of the PEB.

Gradation curve after PEB with different developers

As developers, 0.20 and 0.26 n TMAH solutions were used. The higher the chosen PEB temperature, the higher is also the sensitivity, and also the contrast increases due to the PEB.

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