Developer AR 300-26
For the development of photoresists and novolac-based e-beam resist films
Characterisation
- buffered, colourless aqueous-alkaline solutions for photoresist development with low dark erosion
- AR 300-26 high contrast, steep edges, fast development, particularly suited for thick films
Interesting Resist Wiki articles
Properties
- main component(s)Natriumborat und NaOH
- Application / conditionsTauch-, Puddle-, Sprühentwicklung
- Normality (n)1,10 n
Available order sizes
- 1 x 2.5 L
- 4 x 2.5 L
- 1 x 5 L
- 4 x 5 L
- 20 x 5 L
Please contact us for further requests.