Developer AR 300-47

For the development of photoresists and novolac-based e-beam resist films

Product information

Your request for this product

Characterisation

metal ion-free aqueous-alkaline solutions for the processing of photo/ e-beam resists
reduce the risk of metal ion contamination at the substrate surface
residue-free development
metal ion content < 0.1 ppm
main component TMAH

Interesting Resist Wiki articles

11. May 2022

Chemically enhanced negative resist without cross-linking

9. July 2013

Chemically enhanced negative resist (Process parameters and resolution)

1. July 2013

Resist of the month July 2013: Thermally stable two-layer system – SX AR-N 4340/10 – AR-P 5460

27. February 2013

Aluminium structures developed directly

Properties

Normality (n)
0,20 n
Density at 20 °C (g/cm3)
0,99 g/cm³
Surface tension (mN/m)
max. 32 mN/m
Filtration (μm)
0,2 µm
Storage 6 month (°C)
10 - 22 °C

Available order sizes

1 x 2.5 L
4 x 2.5 L
1 x 5 L
4 x 5 L
20 x 5 L

Please contact us for further requests.

Suitable products

Bottom Resist AR-BR 5460

Positive or negative system for optically transparent and thermally resistant structures

Bottom Resist AR-BR 5480

Positive or negative system for optically transparent and thermally resistant structures

E-Beam Resist AR-N 7500 series

High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C

E-Beam Resist AR-N 7520 new series

Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C

E-Beam Resist AR-N 7520 series

High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C

E-Beam Resist AR-N 7700 series

High-resolution e-beam resists for the production of integrated circuits

E-Beam Resist AR-N 7720 series

AR-N 7720 e-beam resists with flat gradation High-resolution e-beam resists for the production of diffractive optics

E-Beam Resist SX AR-N 8200 series (Medusa 82)

Experimental sample/custom-made product

E-Beam Resist SX AR-N 8250 series (Medusa 82)

Comparable to HSQ, but more process-stable, more sensitive by a factor of 20

Photoresist AR-N 4400 series

Thick and very thick negative resists for electroplating, microsystem technology and LIGA

Photoresist AR-P 3740

Sensitive positive-tone standard resists for the production of highly integrated circuits

Photoresist SX AR-P 3500/8

Positive photoresist for high-temperature application up to 300 °C

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