Developer AR 600-56

For the development of e-beam resists films

Product information

Your request for this product

Characterisation

ultrapure, ultra-filtered (0.2 μm) solvent mixtures
storage at 10-22 °C for 6 month
Main component(s): methyl isobutylketone (MIBK)

Interesting Resist Wiki articles

Properties

Density at 20 °C (g/cm3)
0,788 g/cm³
Refractive index at 20 °C
1,381
Water content max. (%)
0,1 %
Flash point (°C)
12 °C

Available order sizes

1 x 2.5 L
4 x 2.5 L
8 x 2.5 L

Please contact us for further requests.

Suitable products

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 6510 series

Thick positive resists for the production of microcomponents

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

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