Remover AR 600-71
For the stripping of tempered photoresist and e-beam resist films
Please contact us for further requests.
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Characterisation
-
organic solvent
Interesting Resist Wiki articles
Properties AR 600-71
- Main componentdioxolane
- Flash point (°C)-17 °C
Available order sizes
- 1 x 2.5 L
- 4 x 2.5 L
- 8 x 2.5 L
Suitable products
E-Beam Resist AR-N 7500 series
High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C
E-Beam Resist AR-N 7520 new series
Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C
E-Beam Resist AR-P 617 series
Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol
E-Beam Resist AR-P 6200 series (CSAR 62)
High-contrast e-beam resists for the production of integrated circuits and masks
E-Beam Resist AR-P 632 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 639 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 641 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 642 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 649 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 6510 series
Thick positive resists for the production of microcomponents
E-Beam Resist AR-P 661 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 662 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 669 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 671 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 672 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
E-Beam Resist AR-P 679 series
PMMA resist series 50K – 950K for the production of integrated circuits and masks
Photoresist AR-N 2200 series
Ready-to-use negative spray resists for various applications
Photoresist AR-N 4400 series
Thick and very thick negative resists for electroplating, microsystem technology and LIGA
Photoresist AR-P 1200 series
Ready-to-use positive spray resists for various applications
Photoresist AR-P 3200 series
Thick positive resists for electroplating and microsystems technology
Photoresist AR-P 3500 (T) series
Sensitive positive-tone standard resists for the production of integrated circuits
Photoresist AR-P 3740
Sensitive positive-tone standard resists for the production of highly integrated circuits
Photoresist AR-P 5300 series
Sensitive resists for the production of vapour deposition patterns by lift-off
Protective Coating AR-PC 504
Wafer backside protection during front side etchings for the production of deep structures in silicon
Protective Coating AR-PC 5040
Wafer backside protection during front side etchings for the production of deep structures in silicon
Quality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
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Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de