Thinner AR 600-02

For adjusting the film thickness of photoresists and e-beam resists

Product information

Your request for this product

Characterisation

ultra-filtered, colourless, high-purity organic solvent mixtures
adjustment of resist film thickness by defined dilution
Redge bead removal of coated substrates as well as cleaning of equipment

Interesting Resist Wiki articles

15. August 2012

Thinner

Properties

Main component
Anisol
Flash point (°C)
44°C
Water content max. (%)
0,1%
Filtration (μm)
0,2
Non-volatiles max. (%)
Enter your description here

Available order sizes

1 x 1 L

Please contact us for further requests.

Suitable Products

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 8100 series (Phoenix 81)

High-contrast, thermolabile resist for integrated circuits and holographic structures

AR News Newsletter

AR NEWS