Research & Development

Allresist is located at the interface between industry and research….
Driven by the ambivalence of routine standard production and specific customer fulfilment, we developed an exceptional competence which is beneficial for all our customers. In addition to this, we conduct long-term research projects with our cooperation partners since the Allresist was founded. Meanwhile, we have successfully finished 12 research projects, all of them leading to new product developments.
We furthermore carry out a variety of small FuE-projects according to our customer’s specific requirements. These projects result in tailored resists, custom made products, and experimental samples.

Completed scientific projects of the Allresist GmbH

2013 – 2014

Project „VEGAS – Methods and equipment for electronic printable cards with safety attributes, development functional structure resists”

Main cooperation partner: Firma Lüth & Dümchen, Berlin; Technische Universität Berlin; FhG Institut für angewandte Polymerforschung. The targets are smartcards with visual ascertainable information by using of special photoresists.

2012 – 2014

Project „INNOPEP – Covering of innovation success in product development and production”

Main cooperation partner: InMediasP GmbH, Hennigsdorf, ASG Luftfahrttechnik und Sensorik GmbH, Weinheim, BEAR Mühlen & Behälter GmbH, Berlin, Berliner Glas KGaA, Berlin, Fraunhofer-Institut für Produktionsanlagen und Konstruktionstechnik (IPK), Berlin, INPRO mbH, Berlin, MaTec Gummiwerk GmbH, Schwielowsee, Pumacy Technologies AG, Bernburg, TU Berlin, Universität Augsburg, CEPRA. Target: Development of application scenarios, assessment, validation, introduction and distribution

2013

Innovation voucher: „Development and synthesis of tailor made electric conductive polymers as resist component for the mask production in the nanometer range”

Main cooperation partner: Institut für Dünnschichttechnologie und Mikrosensorik, Teltow. Target: Electric conductive resist layer fort he e-beam lithography

2012

Innovation voucher: „Synthesis of structure optimized copolymers for the application in innovative e-beamresists”

Main cooperation partner: Institut für Dünnschichttechnologie und Mikrosensorik, Teltow. Target: Alternative to the ZEP-resist – development oft he CSAR 62

2011

Innovation voucher: „Development and synthesis tailor made Bisazide for innovating photoresists for laser direct exposures > 400 nm wavelength”

Main cooperation partner: Institut für Dünnschichttechnologie und Mikrosensorik, Teltow. Target: Innovative photoresists for laser direct exposures > 400 nm wavelength

2009 – 2011
Project: „Development of cross linked Epoxystyrene for OLED- OFET- and Microstructur-Applications“
Cooperation partner: Fraunhofer Institut für Angewandte Polymerforschung, Golm

2006 – 2008 
Project: „Development of a simplified procedure for the patterning of silicon and silicon oxide, respectively, using wet-chemical methods“ 
Cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.
Aim: Resist systems for hydrofluoric acid- and KOH-etching in glass and silicon, respectively.

2006 – 2008 

Project: “Nano-structures using lift-off-techniques“ 
Cooperation partner: Physical Institute, Bavarian Julius-Maximilians-University, Würzburg
Aim: Sub-50-nm-structures using lift-off-techniques

2004 – 2006 
Project: “Resists for the LIGA and microsystem technology“ 
Cooperation partner: Bessy GmbH, Berlin
Aim: Resist structures with a film size of up to 500 µm

2004 – 2006 
Project: “Resists for OLED photo patterning” 
Cooperation partner: FhG Institute for Applied Polymer Research, Golm
Aim: Patterning of OLEDs

2002 – 2004 
Project: “Characterisation and production of functional films allowing orientation“ 
Cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.
Aim: Orientation films for displays 

2001 – 2004
Project: “Negative resist for MST“ 
Main cooperation partner: Bessy GmbH and CiS Erfurt
Aim: Negative resists for the microsystem technology

2001 – 2002 
Project: “Photoresists for special applications in micro patterning“ 
Main cooperation partner: CiS, Centre for Intelligent Sensors, Erfurt
Aim: Thick photoresist films for the microsystem technology

2000 – 2002 
Project: “Thermo-stable resists“ 
Main cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.
Aim: Thermostable protective coatings for microelectronic applications

1999-2000 
Project: “Photo-polymerizable passive coating for screen printing“ 
ain cooperation partner: Fraunhofer Institute Reliability and Microintegration, Teltow
Aim: Photo-polymerizable passive coating for high precision resistors

1998 – 1999 
Project: “Electron beam analogue resist“ 
Main cooperation partner: University of Joensuu, Finland
Aim: Manufacturing of three-dimensional resist structures for diffractive optics

1997 – 1999 
Project: “Activated photoresists for the additive forming of strip conductors“
Main cooperation partner: TU Dresden, Institute for Microsystem Technology
Aim: Manufacturing of flexible strip conductors via electro-plating of resist structures

1995 – 1998
Project: “Resists for eximer laser“ 
Main cooperation partner: CiS Erfurt
Aim: Resists for eimer laser

1995 – 1996 
Project: “Mask resists“ 
Main cooperation partner: robotron Meiningen GmbH, Advanced Mask Technology Centre Dresden GmbH
Aim: New resist for the production of masks

1995 – 1996
Project: “Resist materials for the nanolithography“ 
Main cooperation partner: Institute for Thin Film and Microsensoric Technology e.V.
Aim: Defect-free layers of resist materials for nano-structures

1994 – 1996 
Project: “Multiprocessing resist“ 
Main cooperation partner: Institute for Semiconductor Physics, Frankfurt/O.
Aim: Resist for mix & match technology e-beam / photolithography

1993 – 1994 
Taking-over of the project “Elster“ from the “Fotochemische Werke“
Main cooperation partner: Institute for Semiconductor Physics, Frankfurt/O.
Aim: Dry-developing e-beam resist