X AR 600-50/2 is a new, very sensitive and highly selective developer for AR-P 617. The dark erosion is very low even at longer development times. Layers of PMMA or CSAR 62 are not attacked, which is especially important for multi-layer processes. The sensitivity can be well adjusted via the development time.
AR-P 617, Film thickness: ~1µm, SB 10 minutes at 200 °C, 50 kV, dose variations, dependence of the sensitivity on the development time in developer X AR 600-50/2 at room temperature, stopper: IPA.
At a development time of 60 s, the dose to clear is approx. 70 µC/cm2, after development for 3 minutes about 40 µC/cm2, after 6 minutes still 25 µC/cm2, and after 10 minutes only 20 µC/cm2! The dark erosion thus remains at moderate < 5%. Developer X AR 600-50/2 shows a pronounced temperature dependence.
AR-P 617, film thickness: ~1 µm, SB 10 minutes at 200 °C, 50 kV, dose variations, dependence of the sensitivity on the development temperature, development time: 3 minutes, stopper: IPA.
The sensitivity considerably increases with raising temperatures. The dose to clear is approximately 48 µC/cm2 at 19 °C, but just about 30 µC/cm2 at 23.5 °C. Enhancing the development temperature results in low dark erosion values of approximately 5 %.
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