Allresist is currently exhibiting at MNE 2026 – Micro and Nano Engineering Conference in Interlaken, Switzerland. At Booth 20, we are pleased to engage in lively technical discussions with customers, partners, researchers and interested visitors from the international micro- and nanotechnology community.
A special highlight of our participation was the technical presentation by our colleague Harry Biller entitled “Allresist – New product developments 2026.” In his talk, he presented some of our latest developments for modern lithography.
One focus was our new HSQ resist Medusa 84 SiH. The HSQ polymer is synthesized in-house by Allresist and dissolved in butyl acetate. This approach is intended to improve shelf life by reducing gelling and particle formation, while also eliminating the use of MIBK as a solvent.
Another key topic was the development of Choline-OH-based developers as an alternative to TMAH. Harry presented, among others, the new AR 300-41 developer for Medusa 84 SiH as well as AR 300-42 for photoresists. The presented test results demonstrate promising approaches for high-performance development processes with a different chemical safety profile.
In addition, Harry Biller introduced a new silicon-containing PPA polymer for direct hard mask fabrication using NanoFrazor technology. This approach is designed to simplify processing by reducing the number of coating and etching steps required.
For us, MNE is above all a valuable opportunity not only to present new developments, but also to discuss requirements, experiences and future applications directly with users and partners.
Are you also attending MNE 2026 in Interlaken?
Come and visit us at Booth 20. We look forward to meeting you and exchanging ideas in person.
