Our customer consultants are currently representing Allresist GmbH at the renowned EIPBN Conference in Denver, USA.
Together with our long-standing partner, the Fraunhofer Institute for Electronic Nano Systems (ENAS), we are presenting a new and forward-looking product development.
The focus is on our new choline-based developer, a safer and more environmentally friendly alternative to conventional TMAH developers. While TMAH poses significant health and environmental risks due to its high acute toxicity, choline hydroxide offers a considerably safer and more biodegradable solution. Studies have shown that the new developer still achieves comparable — and in some applications even superior — performance.
The investigations included the development of positive and negative photoresists as well as HSQ-based e-beam resists. It was demonstrated that our choline-hydroxide-based developers achieve development rates similar to conventional 2.38% TMAH developers for positive and negative photoresists as well as HSQ-based e-beam resists. In addition, very high contrasts and fine structures down to isolated 25 nm lines were successfully realized for HSQ resists such as our Medusa 84 SiH.
The new developers will become part of the Allresist portfolio under the product names AR 300-41 and AR 300-42. Together with Fraunhofer ENAS, a scientific abstract was submitted for the conference and a joint poster was subsequently created.
With this development, Allresist consistently pursues its vision of becoming the “No. 1 for innovative resists worldwide” — combined with a responsible approach toward people and the environment. This new product development exemplifies our core values: innovation, quality, sustainability, and strong partnerships.
We are looking forward to the intensive professional exchange at the EIPBN conference and to further advancing innovative and sustainable solutions for micro- and nanotechnology together with our partners.