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All 308 /Adhesions Promoter 3 /Allresist 0 /AR NEWS 26 /Basic Chemistry 7 /Basics 0 /Bottom Resist 4 /Developer 12 /E-Beam Resist 0 /FAQ 20 /FAQ 11 /General 1 /General 13 /General 5 /General 2 /Home 19 /Home Resist 29 /Negative 18 /Negative 12 /News 15 /Newspaper Article 2 /Other Resists 15 /Other Resists 24 /Photoresist 1 /Positive 13 /Positive 29 /Press 0 /Process Chemicals 0 /Process Information 4 /Process Procedures 8 /Protective Resist 8 /R&D 2 /R&D Projects 4 /Remover 6 /Resist of the month 39 /Resist Wiki 2 /Scientific Article 3 /Stopper 1 /Thinner 2 /z-SX-AR-PC 5000/41 1 /z_AR 300-12 4 /z_AR 300-26 / 300-35 5 /z_AR 300-40 4 /z_AR 600-01 - 09 1 /z_AR-N 4400 4 /z_AR-N 4600 3 /z_AR-P 3100 2 /z_AR-P 617 1 /z_AR-P 6200 10 /z_AR-P 630-670 1 /z_AR-P-8100 4 /z_AR-PC 5090/91 3 /z_SX AR-N 8200 5 /z_SX AR-P 3500/8 2
July 2024: Medusa 84 AR-N 8400 SiH, the improved HSQ alternative, in market launch
18. July 2024/by msendel49th Issue of the AR NEWS
28. April 2024/by uschirmerJanuary 2024: Electra 92 established on the market – AR-PC 5092.02
29. January 2024/by uschirmerStrategy workshop: we will not be available for you on January 30, 2024!
18. January 2024/by uschirmerDonation for completed customer surveys
20. December 2023/by uschirmerImportant information about deliveries between years
15. November 2023/by uschirmer48th Issue of the AR NEWS
16. October 2023/by uschirmerOctober 2023: Medusa 84 SiH – SX AR-N 8400 another alternative to HSQ
6. October 2023/by msendelApril 2023: E-beam PMMA resist AR-P 672.045 – the workhorse for electron beam lithography
24. April 2023/by uschirmer47th Issue of the AR NEWS
13. April 2023/by uschirmerJanuary 2023: Standard resist AR-P 3510 – 30 years on the world market
15. January 2023/by uschirmerStrategy workshop – we will not be available for you on January 13th, 2023!
12. January 2023/by uschirmerOctober 2022: Optimised Electra 92 – a new AR-PC 5092
19. October 2022/by uschirmer46th Issue of the AR NEWS
19. October 2022/by uschirmer30 years Allresist
26. August 2022/by uschirmerPoly(phthalaldehyde)-based electron beam resists, University of Tübingen
27. July 2022/byJuly 2022: Our resist triplet of the month – presented at the Triple-Beam (EIPBN 2022)
4. July 2022/byPositive two- layer lift-off system
14. June 2022/byElectron beam resists
13. June 2022/byElectron beam lithography systems
9. June 2022/byGeneration of secondary electrons
9. June 2022/byE-beam resist: Procedures
9. June 2022/byThree-layer system CSAR/PMMAcoMA/PMMA
9. June 2022/byT-gates with three-layer system CSAR/PMMAcoMA/PMMA
8. June 2022/byBasics
8. June 2022/byE-beam resists: General
8. June 2022/byScattering
8. June 2022/byWriting time
8. June 2022/bySCALPEL
7. June 2022/byRaster and vector scan principle
7. June 2022/byProximity effect
7. June 2022/byLaser ablation of PPA (Phoenix 81)
7. June 2022/byATLAS 46 in general
7. June 2022/byBlack resist
1. June 2022/byGeneral: Resist composition
1. June 2022/byReady-to-use spray resists with EVG devices (positive and negative)
31. May 2022/byThermally stable two-layer lift-off systems
25. May 2022/byDilution of resists
25. May 2022/byAdhesive strength
24. May 2022/byOne-layer and two-layer lift-off
24. May 2022/byCSAR 62 – Mechanism of action
24. May 2022/bySolution
23. May 2022/byLoading
23. May 2022/byNew solvent remover
19. May 2022/byWaterfree developable special resist SX AR-N 4810/1
19. May 2022/byTop surface imaging (TSI) photoresist – principles
19. May 2022/byPositive resist for temperature sensitive substrates
12. May 2022/byChemically enhanced negative resist without cross-linking
11. May 2022/byProcess conditions
11. May 2022/byAqueous-alkaline removers
25. April 2022/by45th Issue of the AR NEWS
21. April 2022/by AllAdminTypes of developers
14. April 2022/bySolvents and workplace safety
14. April 2022/bySolvent removers
14. April 2022/byApril 2022: New environmentally friendly developer for PMMA resists AR 600-57
4. April 2022/byProtective coating as spray resist for the smoothing of surfaces
22. March 2022/byPPA for two layer applications
22. March 2022/byAR-P 617 Two layer lift-off system
22. March 2022/byPMMA e-beam resist, positive and negative in the case of overexposure, suitable for bridge structures
21. March 2022/byPMMA e-beam resist with flat gradation for three-dimensional structures
21. March 2022/byTemperature resistance of e-beam polymers
15. March 2022/byCSAR 62 nanostructures written at 100 kV
14. March 2022/byAllresist supports Ukraine
7. March 2022/byHigh-resolution negative e-beam resist AR-N 7520.17new for etching application
2. March 2022/byOrder of Merit of the State of Brandenburg for Brigitte and Matthias Schirmer
2. February 2022/by uschirmerJanuary 2022: Versatile Phoenix 81 (AR-P 8100)
13. January 2022/by uschirmerNegative poly(hydroxystyrene) and (hydroxystyrene-co-MMA) photoresist with high-temperature stability
13. January 2022/by44th Issue of the AR NEWS
14. October 2021/by uschirmerOctober 2021: More efficient production of Electra 92
1. October 2021/by uschirmerJuly 2021: CAR 44 for galvanic molding
6. July 2021/by43rd Issue of the AR NEWS
9. April 2021/byApril 2021: CSAR 62 – In demand around the world
30. March 2021/byJanuary 2021: Optimised process for negative photoresist Atlas 46
20. January 2021/by uschirmer42nd Issue of the AR NEWS
9. October 2020/byJuly 2020: Bottom resist AR-BR 5400, the “workhorse” for two-layer processes
28. July 2020/by AllAdminForays through the lithography of microelectronics (Matthias Schirmer)
20. May 2020/by AllAdminCustomer information Corona virus
15. May 2020/by AllAdmin41st issue of the AR NEWS
9. April 2020/byJanuary 2020: Black resist SX AR-N 8355/7
25. February 2020/by AllAdminOktober 2019: Medusa 82 UV
22. October 2019/by AllAdmin40th issue of the AR NEWS
22. October 2019/by AllAdminFörderung unternehmensWert:Mensch
4. October 2019/by AllAdminAllresist presents Medusa 82 at the MNE 2019 in Rhodes
30. September 2019/by AllAdminProduktentwicklungen
10. May 2019/by AllAdminExtension of the production facilities
29. April 2019/by AllAdminApril 2019: Phoenix 81
22. April 2019/by AllAdmin39th Issue of the AR NEWS
22. April 2019/by AllAdmin38th Issue of the AR NEWS
22. October 2018/by AllAdminResist of the Month of October: Medusa 82 – alternative to HSQ
21. October 2018/by AllAdminEinweihung des neuen 450 m² großen Anbaues zum 26. Firmenjubiläum
16. October 2018/by AllAdminCAR 44 for e-beam lithography
12. October 2018/by AllAdminAtlas 46 for e-beam lithography
12. October 2018/by AllAdminMedusa 82 for EUV applications
12. October 2018/by AllAdminMedusa 82: Influence of post exposure bake (PEB)
12. October 2018/by AllAdminMedusa 82 with photoacid generator (PAG)
12. October 2018/by AllAdminGreat success with Medusa 82 at the MNE
28. September 2018/by AllAdminStructuring by ablation of the resist materials
9. July 2018/by AllAdminPhoenix 81 – Storage conditions and dispatch
9. July 2018/by AllAdminMedusa 82 – the alternative to HSQ-resists, storage stability
9. July 2018/by AllAdminBlack-Protect – stable protective coating for HF and KOH etchings
9. July 2018/by AllAdminBleachable resists
9. July 2018/by AllAdminResist of the Month July: Medusa 82 – the alternative to HSQ-resists
3. July 2018/by AllAdminAllresist at the EIPBN 2018 Conference in Puerto Rico
6. June 2018/by AllAdmin2L-Lift-off system AR-P 617 – AR-P 8100
25. April 2018/by AllAdminCSAR 62 single layer lift-off system
25. April 2018/by AllAdminFluorescent resist structures with photoresists
25. April 2018/by AllAdmin37th issue of the AR NEWS
22. April 2018/by AllAdminResist of the month of April: Fluorescent negative photoresist Atlas 46 S
6. April 2018/by AllAdminSX AR-PC 5060 F-Protect (replacement for Cytop)
15. January 2018/by AllAdminAtlas 46 for nanoimprint lithography
15. January 2018/by AllAdminResist of the month January: SU 8 alternative – negative photoresist Atlas 46
2. January 2018/by AllAdminZeitungsartikel zu 25 Jahren Allresist
14. November 2017/by AllAdmin36th Issue of the AR NEWS
22. October 2017/by AllAdmin25 years of Allresist – A reason to celebrate!
16. October 2017/by AllAdminCSAR 62 for thick films
11. October 2017/by AllAdminFluorescent resist structures
11. October 2017/by AllAdminColoured negative photoresists
11. October 2017/by AllAdminInnovative new development at the MNE 2017
28. September 2017/by AllAdmin35th special issue of the AR NEWS
21. September 2017/by AllAdminResist of the month of October: Fluorescent resist structures with SX AR-P 672.08
18. September 2017/by AllAdminDevelopment cascade
11. July 2017/by AllAdminCAR 44 on copper
11. July 2017/by AllAdminNew AR 300-80 and contact angle measurement
11. July 2017/by AllAdminAllresist auf der MNE und Semicon
10. May 2017/by AllAdmin34th issue of the AR NEWS
21. April 2017/by AllAdminAllresists neue Produktentwicklungen in den Startlöchern
15. April 2017/by AllAdminForschungsprojekte
4. April 2017/by AllAdminBrandenburger Innovationsfachkräfte
4. April 2017/by AllAdminE-Beam Resist
3. April 2017/by AllAdminResist-Wiki
3. April 2017/by AllAdminResist of the month April – Thermally developable positive resist Phoenix 81
3. April 2017/by AllAdminEurostar-Projekt: PPA-Litho
31. March 2017/by AllAdminEurostar-Projekt: PPA-Litho
31. March 2017/by AllAdminAllresist now offers many solvents in lightweight HDPE bottles
17. February 2017/by AllAdminTop Surface Imaging E-Beamresist
3. February 2017/by AllAdminFabrication of vertical flanks with CAR 44
20. January 2017/by AllAdminUse of PPA in multilayer processes
20. January 2017/by AllAdminResist of the month January 2017: Optimised negative spray resist AR-N 2200
2. January 2017/by AllAdmin33rd issue of the AR NEWS
16. October 2016/by AllAdminProtective coating to prevent mechanical damage
4. October 2016/by AllAdminResist of the month October 2016: Optimised T-gate structures with three-layer system PMMA, copolymer 617 and CSAR 62
1. October 2016/by AllAdminManufacture of undercut structures for T-gates in three-layer processes
29. September 2016/by AllAdminAdditional new experimental developers for AR-P 617
29. September 2016/by AllAdminNew developers for PMMAcoMA (AR-P 617, 50 kV)
29. September 2016/by AllAdminEvaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)
29. September 2016/by AllAdminSurface imaging resist system SX AR-N 7100 – silylable photoresist
4. July 2016/by AllAdminUse of CSAR 62 for the manufacture of nanostructures on GaAs substrates
4. July 2016/by AllAdminEvaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)
4. July 2016/by AllAdminInterference lithography
4. July 2016/by AllAdminResist of the month July 2016: Negative PMMA resist for photolithography
1. July 2016/by AllAdmin32nd issue of the AR NEWS
21. April 2016/by AllAdminHighly sensitive e-beam resist AR-P 617 (PMMA-copolymer)
13. April 2016/by AllAdminCSAR 62 for EUV applications
13. April 2016/by AllAdminHF etching of GaAs with CSAR 62 masks
13. April 2016/by AllAdminBOE etching of SiO2 with CSAR 62 mask
13. April 2016/by AllAdminNew developers for AR-P 617
13. April 2016/by AllAdminUtilising Electra 92 for SEM applications
13. April 2016/by AllAdminBrandenburgs Wirtschaftsminister Albrecht Gerber bei Allresist zu Besuch – Photovoltaikanlage verbessert Ökobilanz 2015
11. February 2016/by AllAdminTwo-layer e-beam resist system with novolacs as bottom resist
19. January 2016/by AllAdminDetermining the conductivity of Electra 92 layers on glass
19. January 2016/by AllAdminAlkali-stable positive resist obtained after treatment with HMDS
19. January 2016/by AllAdminResist of the month January 2016: Electra 92 has now gone into production!
1. January 2016/by AllAdmin31st issue of the AR NEWS
21. October 2015/by AllAdminFachartikel in der Nanotechnologie (Electra 92)
12. October 2015/by AllAdminManufacture of plasmonic nanostructures with CSAR 62
5. October 2015/by AllAdminCSAR 62 – Experimental studies on new, sensitive developers
5. October 2015/by AllAdminCSAR 62 – Development at low temperatures
5. October 2015/by AllAdminCSAR structures on glass
5. October 2015/by AllAdminPMMA lift-off structures on semi-precious stone substrates using Electra 92
5. October 2015/by AllAdminElectra 92 variant optimised for applications on novolac-based resists
5. October 2015/by AllAdminConductivity under the application conditions of e-beam lithography
5. October 2015/by AllAdminLong-term stability of Electra 92
5. October 2015/by AllAdminResist of the month October 2015: E-beam lithography on glass – CSAR 62 and Electra 92
1. October 2015/by AllAdminAdaptable two-layer resist AR-BR 5460 for variable lift-off structures
21. July 2015/by AllAdminStructuring of polyphthalaldehydes with photolithography
21. July 2015/by AllAdminPoly(phthalaldehyde)-based electron beam resists
21. July 2015/by AllAdminResists for novel applications in lithography – thermally structurable polymers
21. July 2015/by AllAdminEthanol and toluene-resistant photoresist AR-U 4060
21. July 2015/by AllAdminPatterning of the conductive protective coating Electra 92
21. July 2015/by AllAdminHigh resolution on quartz with Electra 92 on HSQ resists
21. July 2015/by AllAdminTwo-layer photoresist system for water-sensitive substrates
21. July 2015/by AllAdminResist of the month Juli 2015: Process-adapted two-layer resist AR-BR 5460
1. July 2015/by AllAdminDose-dependent structure size with negative resists
20. May 2015/by AllAdminGeneration of undercut structures with negative resists
20. May 2015/by AllAdminSensitive negative resist for 405 nm laser direct exposure
20. May 2015/by AllAdminNegative CAR PMMA resist SX AR-N 4810/1
20. May 2015/by AllAdminStabilisation/ hardening of resist films
20. May 2015/by AllAdminAlkaline developers for aluminium substrates
20. May 2015/by AllAdminNew developer for AR-P 5320
20. May 2015/by AllAdmin30th issue of the AR NEWS
21. April 2015/by AllAdminResist of the month April 2015: High-sensitivity negative resist AR-N 4400-10
1. April 2015/by AllAdminW+M-Artikel: Das Monopol geknackt
3. March 2015/by AllAdminFachartikel in der Nanotechnologie (CSAR 62)
22. January 2015/by AllAdminResist of the month January 2015: High temperature-resistant positive resist
1. January 2015/by AllAdminFachartikel im Magazin für Oberflächentechnik
22. November 2014/by AllAdminWater-based resists
27. October 2014/by AllAdminNIR-laser structurable photoresists
27. October 2014/by AllAdminDeveloper AR 300-35 for alkali-sensitive substrates
27. October 2014/by AllAdminThermostable photoresists
27. October 2014/by AllAdminPMMA protective coating: reduction of cotton candy effect
27. October 2014/by AllAdminSafer solvent PMMA protective coating
27. October 2014/by AllAdminSensitive negative PMMA resist (CAR)
27. October 2014/by AllAdminCSAR 62 Avoidance of particles during large-area exposures
27. October 2014/by AllAdminCSAR 62 lift-off for thick layers
27. October 2014/by AllAdminCSAR 62 thick layers
27. October 2014/by AllAdmin29th issue of the AR NEWS
21. October 2014/by AllAdminResist of the month October 2014: Safer solvent
1. October 2014/by AllAdminResist of the month July 2014: Electra 92
1. July 2014/by AllAdminNew safer solvent remover AR 300-76
13. June 2014/by AllAdminAqueous negative resist based on gelatine
13. June 2014/by AllAdminThick CSAR 62
13. June 2014/by AllAdminDeveloper for CSAR 62 (AR-P 6200)
13. June 2014/by AllAdminLaser direct exposure with AR-P 3540
13. June 2014/by AllAdminChemically amplified, highly sensitive negative e-beam resist SX AR-N 7730/37
13. June 2014/by AllAdminRatio resolution and dose, exemplarily shown for e-beam resist SX AR-N 7530/1
13. June 2014/by AllAdminAlkali-stable, easily structurable positive resist SX AR-P 5900/8
13. June 2014/by AllAdminImproved protective coating SX AR-PC 5000/31
13. June 2014/by AllAdmin28th Issue of the AR NEWS
21. May 2014/by AllAdminResist of the Month Archive: April 2014
1. April 2014/by AllAdmin27th issue of the AR NEWS
21. October 2013/by AllAdminAdhesive strength of AR 300-80
7. October 2013/by AllAdminDevelopment of thick negative resist layer
7. October 2013/by AllAdminResist of the Month Archive: October 2013
1. October 2013/by AllAdminChemically enhanced negative resist (Process parameters and resolution)
9. July 2013/by AllAdminNegative two- layer lift-off system
9. July 2013/by AllAdminSolvents in e-beam resists
9. July 2013/by AllAdminResist of the month July 2013: Thermally stable two-layer system – SX AR-N 4340/10 – AR-P 5460
1. July 2013/by AllAdminResist of the month April 2013: Positive e-beam resist CSAR 62 – an alternative to ZEP 520
1. April 2013/by AllAdminPolymers (film formers)
20. March 2013/by AllAdminAdhesion promoter HMDS and diphenylsilanediol (AR 300-80)
28. February 2013/by AllAdminPositive polyimide one-layer resist
27. February 2013/by AllAdminCollapse of extreme high-resolution e-beam resist structures
27. February 2013/by AllAdminNew procedure for the spray coating of deep topologies with SX AR-P 1250/20
27. February 2013/by AllAdminAluminium structures developed directly
27. February 2013/by AllAdminAR-N 7700, 4 µm thick, proximity effect
27. February 2013/by AllAdminPhotoresist coatings on Teflon substrates
27. February 2013/by AllAdminDiffractive optics with the “analogous“ e-beam resist
27. February 2013/by AllAdminNegative polyimide photoresist
27. February 2013/by AllAdminExposure
27. February 2013/by AllAdmin26th issue of the AR NEWS
21. February 2013/by AllAdminResist of the month January 2013: Negative p hotoresists SX AR-N 4340/8 – a resist for laser interference lithography (LIL)
1. January 2013/by AllAdmin25th issue of the AR NEWS
21. October 2012/by AllAdminResist of the month October 2012: Negative photoresists AR-N 4400 – with optimized bake regime
1. October 2012/by AllAdminTwo-layer PMMA e-beam resist system for high-resolution lift-off
21. September 2012/by AllAdminWet chemical etching
31. August 2012/by AllAdminAlternatives for NMP-based removers
31. August 2012/by AllAdminHigh-resolution PMMA one layer resist
31. August 2012/by AllAdminUV-structuring of PMMA resists
31. August 2012/by AllAdminPolyimide two-layer systems
31. August 2012/by AllAdminSpray resists for different topologies (negative)
31. August 2012/by AllAdminSpray resists for different topologies (positive and negative)
31. August 2012/by AllAdminResist for 488 nm exposure wavelength
31. August 2012/by AllAdminChemical dry etching
31. August 2012/by AllAdminThinner
15. August 2012/by AllAdminProcess procedure photoresists
30. July 2012/by AllAdminProcess procedure e-beam resist
30. July 2012/by AllAdminDevelopment procedures
30. July 2012/by AllAdminRemovers in general
30. July 2012/by AllAdminUV-curing
30. July 2012/by AllAdminStopper
30. July 2012/by AllAdminPrinciple and functioning
24. July 2012/by AllAdminResist for near infrared (NIR)
16. July 2012/by AllAdminTwo-layer resist system for hydrofluoric acid etching
16. July 2012/by AllAdminProtective coating for KOH-etching
16. July 2012/by AllAdminAlkali-stable and solvent-stable negative resist
16. July 2012/by AllAdminTemperature-stable negative resist
16. July 2012/by AllAdminOther resist components
16. July 2012/by AllAdminAgeing of developer
13. July 2012/by AllAdminPositive polyimide resist for e-beam-lithography
13. July 2012/by AllAdminHigh-resolution negative e-beam resist
13. July 2012/by AllAdminLift off (one layer – two layer)
13. July 2012/by AllAdminComposition of photoresists
13. July 2012/by AllAdminPhotosensitive components
13. July 2012/by AllAdminCross linker
13. July 2012/by AllAdminStorage and ageing
13. July 2012/by AllAdminSensitive, etch-stable negative e-beam resist for processes without yellow light
13. July 2012/by AllAdmin24nd issue of the AR NEWS
21. April 2012/by AllAdmin1. What are e-beam resists composed of, and how do they work?
23. August 2008/by AllAdmin2. For how long are e-beam resists stable, and what are the optimal storage conditions?
22. August 2008/by AllAdmin1. What are photoresists composed of, and how do they work?
21. August 2008/by AllAdmin3. What is the optimal pre-treatment of substrates for e-beam resist application?
21. August 2008/by AllAdmin2. For how long are photoresists stable, and what are the optimal storage conditions?
20. August 2008/by AllAdmin4. How high is the adhesion strength of e-beam resists to different wafers?
20. August 2008/by AllAdmin3. How may age-related changes influence the quality of a photoresist?
19. August 2008/by AllAdmin5. How are e-beam resists exposed? How can the optimum exposure dose be determined?
19. August 2008/by AllAdmin4.What is the optimal pre-treatment of substrates for photoresists?
18. August 2008/by AllAdmin6. Which developers are optimal for e-beam resists, and how do factors like developer concentration and temperature influence the result?
18. August 2008/by AllAdmin5. What are the adhesion features of photoresists on different wafers?
17. August 2008/by AllAdmin7. How can e-beam resist films be removed again?
17. August 2008/by AllAdmin6. What are the optimum coating parameters for photoresists in order to achieve good film images?
16. August 2008/by AllAdmin8. Which resolutions do e-beam resists achieve?
16. August 2008/by AllAdmin7. Why may air bubbles develop in photoresist films, and how can they be avoided?
15. August 2008/by AllAdmin9. How high is the plasma etch resistance of e-beam resists?
15. August 2008/by AllAdmin8. What is the function of the softbake of photoresist films after the coating?
14. August 2008/by AllAdmin10. How high is the etch resistance of e-beam resists in the presence of strong acids?
14. August 2008/by AllAdmin9. How are photo resists exposed, and how can the optimum exposure dose be determined? How long can coated and exposed substrates be stored prior to exposure?
13. August 2008/by AllAdmin11. How high is the solvent resistance of e-beam resist films?
13. August 2008/by AllAdmin10. Which developers are optimal for photoresist, and how do factors like developer concentration and temperature influence the result?
12. August 2008/by AllAdmin11. How can resist coatings be removed again?
11. August 2008/by AllAdmin12. What is the application range of protective coatings?
10. August 2008/by AllAdmin13. How do image reversal resists work?
9. August 2008/by AllAdmin14. How can undercut patterns (lift-off structures) be produced in one- or two layer systems?
8. August 2008/by AllAdmin15. How can thick films of > 10 µm be processed in an optimal way?
7. August 2008/by AllAdmin16. Which resolution and which contrast can be obtained with photoresists?
6. August 2008/by AllAdmin17. How high is the plasma etch resistance of photoresists?
5. August 2008/by AllAdmin18. How high is the etch resistance of photoresist in the presence of strong acids?
4. August 2008/by AllAdmin19. Which photoresists are suitable for hydrofluoric acid (HF) etching?
3. August 2008/by AllAdmin20. How high is the solvent resistance of photoresist films?
2. August 2008/by AllAdminQuality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
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Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de