E-beam PMMA resist AR-P 672.045
The workhorse for electron beam lithography
When Allresist was founded 30 years ago, also PMMA resists for electron beam lithography were included in the product portfolio. The PMMA copolymer which had been developed during the GDR area (formerly PSKL, now AR-P 617) and the self-produced PMMAs (molecular weight 50k and 200k) were retained and complemented by PMMAs with higher molecular mass (600k and 950k).
The entire resist family AR-P 630 – 670 is characterised by very reliable and easy handling as well as an unsurpassed long-term stability. The new, “green” developer AR 600-57 based on water and isopropanol further increases the attractiveness of this resist group. Only slightly longer writing times compared to other e-beam resists (e.g. CSAR 62) have to be accepted.
Due to the high sales volume, AR-P 672.045 is our internal “market leader”. This resist is used by three major microchip manufacturers in France, Germany, and China. The consumption is thus steadily increasing, and meanwhile more than 300 liters of this resist are ordered annually.
Siemens star, produced with AR-P 672.045
The high level of reliability and continued market success have prompted us to choose AR-P 672.045 as the resist of the month of April.