Entries by Ulrike Schirmer

S3 Alliance visits Allresist

S3 Alliance visited our premises to strengthen our partnership. They distribute Allresist products in the UK and are a market-oriented organization with more than 20 years of experience in the semiconductor/MEMS, renewable energy, biotechnology, and related fields.

52nd Issue of the AR NEWS

Content: 1. Allresist at the conferences EIPBN 2025 and MNE 2025 // 2. Medusa 84 – AR-N 8400 SiH, the reliable alternative to HSQ resist // 3. The new choline developer AR 300-41 – a safe alternative to TMAH developers

October 2025: Medusa 84 – the reliable alternative to HSQ resist

Medusa 84 samples were furthermore stored for 3.5 months at -30 °C, at 0 °C, and at room temperature. Surprisingly, there was hardly any difference between the three storage conditions with respect to the quality of the resist. Regardless of the storage temperature, all samples exhibited a minimum line width between 3.6 and 4.2 nm.

51st Issue of the AR NEWS

Content: 1. Allresist at the conferences EIPBN 2025 and MNE 2025 // 2. Medusa 84 – AR-N 8400 SiH: High-performance alternative to HSQ-based resists // 3. Allresist establishes new facility in Teltow // 4. ZIM-project successfully completed: Development of a photoresist for structuring non-planar objects

April 2025: New environmentally friendly remover AR 300-77

In line with our responsibility toward users and employees, we have investigated alternatives to replace these removers and identified carbonate-based solvents as promising candidates. Our new remover, AR 300-77, consists of a mixture of propylene carbonate and diethyl carbonate and can be used without risk in compliance with all relevant safety standards.

50th Issue of the AR NEWS

Content: 1. Allresist at the EIPBN and MNE conferences 2024 / 2. Worldwide interest in Medusa 84 – AR-N 8400 SiH / 3. Daughter Ulrike Schirmer now appointed as Managing Director / 4. Our current environmental activities: Tree planting / 5. No price increases for listed products in 2025😊