Entries by uschirmer

January 2023: Standard resist AR-P 3510 – 30 years on the world market

Right from the beginning, the idea of sustainability was firmly anchored in the philosophy of our young company. One of the first advanced developments of Allresist was the replacement of teratogenic solvents in the positive photoresist AR-P 351 with safer solvents. This is how the standard resist AR-P 3510 was created, in which the excellent lithographic properties of AR-P 351 were retained, but the resist was now significantly less dangerous to health for the user.

October 2022: Optimised Electra 92 – a new AR-PC 5092

We have now achieved a quality of aniline polymers that does not require the addition of isopropanol, which also increases the stability of AR-PC 5092 resist mixtures. Long-term tests demonstrated that the storage stability is significantly higher than with previous Electra variants.

46th Issue of the AR NEWS

1. 30 years of Allresist: Appreciation by Prime Minister Woidke
2. Allresist on the EIPBN in New Orleans
3. Further improved Electra 92 – new AR-PC 5092
4. Allresist on the MNE in Leuven
5. Rubin-project – waveguide materials for the NIR/VIS-range
6. Allresist determines its CO2 footprint

30 years Allresist

This anniversary is a special highlight for us, now looking back on 30 years of a very successful company history in which we have been able to implement our vision of an ecologically sustainable, but still economical resists production step by step.

Order of Merit of the State of Brandenburg for Brigitte and Matthias Schirmer

On January 28, 2022, Brigitte and Matthias Schirmer were awarded the Order of Merit of the State of Brandenburg by Prime Minister Dietmar Woidke. This extraordinarily high award for special achievement recognizes their work and in particular their commitment to sustainability. From the very beginning, it was of particular importance for the Schirmer couple to implement not only economic success, but with equal importance social and ecological aspects in their newly founded company Allresist.

January 2022: Versatile Phoenix 81 (AR-P 8100)

Phoenix 81 was developed as part of a Eurostar project in cooperation with Swisslitho AG (now Heidelberg Instruments Nano). Using a NanoFrazor and thermal scanning probe lithography (t-SPL), structures as small as 10 nm can be written by dipping a hot needle into the resist layer and evaporating the resist at the tip (see also AR NEWS, 42nd issue).

44th Issue of the AR NEWS

1. Working in the times of Corona
2. More efficient manufacture of Electra 92
3. RUBIN – highly promising project in optical sensor technology
4. EOS 72, a chemically amplified positive e-beam resist
5. Contribution against climate changes: Allresist plants trees

October 2021: More efficient production of Electra 92

Many companies meanwhile use the conductivity of Electra layers for their processes and technologies. Since its introduction on the market in 2018, synthesis and processing of Electra have continuously been improved. The conductivity of this resist could for example be increased by a factor of five between 2018 and 2020.