This author has not written his bio yet.
But we are proud to say that Ulrike Schirmer contributed 35 entries already.
Content: 1. Allresist at the conferences EIPBN 2025 and MNE 2025 // 2. Medusa 84 – AR-N 8400 SiH: High-performance alternative to HSQ-based resists // 3. Allresist establishes new facility in Teltow // 4. ZIM-project successfully completed: Development of a photoresist for structuring non-planar objects
In line with our responsibility toward users and employees, we have investigated alternatives to replace these removers and identified carbonate-based solvents as promising candidates. Our new remover, AR 300-77, consists of a mixture of propylene carbonate and diethyl carbonate and can be used without risk in compliance with all relevant safety standards.
Thanks to its excellent stability, we can now extend the shelf life of Electra 94 to two years. Ongoing continuous quality control will provide information on whether extending the shelf life beyond two years is possible.
We would like to inform you about the further development of our high-tech resists Medusa 84, Electra 94 and Phoenix 81.
In order to align operational procedures with the needs of our customers, we have set a final order acceptance date: Order stop: 12/11/2024 and Delivery stop: 12/13/2024
Content: 1. Allresist at the EIPBN and MNE conferences 2024 / 2. Worldwide interest in Medusa 84 – AR-N 8400 SiH / 3. Daughter Ulrike Schirmer now appointed as Managing Director / 4. Our current environmental activities: Tree planting / 5. No price increases for listed products in 2025😊
Allresist will soon offer ready-to-use resists as a replacement for HSQ in three different layer thicknesses: 50 nm (4,000 rpm, 4 % solids), 100 nm (4,000 rpm, 7 % solids), 400 nm (4,000 rpm, 23 % solids) → 1.0 µm / 800 rpm
Content:
1. Allresist at the “8th Thermal Probe Workshop“ of Heidelberg Instruments Nano AG
2. From PPA powder to liquid resist: Phoenix 81
3. Medusa 84 SiH – SX AR-N 8400: Market launch has begun
4. Our current environmental activities: another tree-planting event!
At AMOLF, Electra 92 was applied to HSQ deposited on a 40 nm thick SiO2 layer of a silicon wafer. Due to its highly hydrophobic surface, HSQ is particularly challenging. A specially adapted version of Electra 92 was required for this task.
We will not be available for you on Tuesday, January 30, 2024 because of our strategy workshop but we will immediately take care of all inquiries and orders from January 31, 2024 again.
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de
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