Allresist developed Phoenix 81 (AR-P 8100) within the scope of a Eurostars project together with SwissLitho AG and other partners. SwissLitho recently added a laser direct writer to the NanoFrazor device (see Fig. 1)
1. Synthesis week in the new production tract
2. Allresist at the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 passed comprehensive application tests
3.1. Dissolution test with the sensitive PAG-Medusa 82 (SX AR-N 8250)
3.2. Influence of a PEB on the sensitivity of Medusa 82
3.3. Plasma etching tests with Medusa structures
3.4. Medusa 82 with specifically low contrast
4. Five coloured negative resists on one glass wafer
1. 26 years of Allresist – Inauguration of the new plant on the company anniversary
2. Allresist’s great success with Medusa 82 at the MNE 2018
3. Further Allresist highlights at the MNE
4. Atlas 46 and CAR 44 for e-beam lithography
5. Phoenix 81 – World-wide sales begin!
6. Offspring at Allresist – The next generation!
Allresist now developed Medusa 82 as an alternative to HSQ resists. Due to a modification of the polymer, resist Medusa 82 can be handled very easily.
Once again Allresist participated in the MNE with a large, attractive booth and new innovations. As in past years, the interest of the conference participants in our diverse new developments was great. The absolute highlight however was the introduction of our Medusa 82, an excellent alternative to HSQ resists.
Our research team successfully developed a negative resist with high resolution and plasma etching stability in oxygen. Already with the first samples, it was possible to achieve the properties of HSQ.
Allresist attended the “triple-beam” conference EIPBN 2018 for the first time. Matthias Schirmer and Dr. Christian Kaiser answered many inquiries at the exhibition stand, especially questions regarding electron beam resists.
1. Our building extension is progressing
2. Allresist at the congresses Triple Beam (EIPBN 2018) and MNE 2018
3. Atlas 46 variants for a selective two-layer build-up
4. Fluorescent resists for optics and sensors with Atlas 46 S
5. Medusa 82 – a resist turning into “stone” structures
6. New protective coating for KOH/HF etchings – BlackProtect SX AR-PC 5000/41
These poly(phthalaldehydes) are also suitable for electron beam lithography and for the fabrication of 200 nm thick fibers (electrospinning). The material produced from these threads evaporates immediately upon heating, which offers interesting application possibilities.
The outstanding properties of SU-8 are well known to all users of microsystem technologies. Allresists new negative resist Atlas 46 S (solid) can easily be processed with high reproducibility of all properties and with high restistance of resist structures to all commonly used solvents. Atlas 46 S is thus perfectly suitable for all applications in which the layer is intended to remain permanently and resistively on the substrate.