Fachartikel in der Nanotechnologie (Electra 92)
Die Fachzeitschrift “Nanotechnologie” schrieb im Oktober 2015 einen interessanten Artikel über die Erfolgsgeschichte unseres Electra 92.
Resist of the month October 2015: E-beam lithography on glass – CSAR 62 and Electra 92
Allresist presented this precise and easy to handle two-layer system already on the MNE (Micro and Nano Engineering) 2015 in Den Haag with great success.
Resist of the month Juli 2015: Process-adapted two-layer resist AR-BR 5460
The bottom resist AR-BR 5460 has already been used for a decade in combination with positive (e.g. AR-P 3510) or negative resists (e.g. AR-N 4340) for a large variety of lift-off applications.
30th issue of the AR NEWS
Content:
1. Investment in sun energy – Allresist installed a rooftop photovoltaic system
2. Highly sensitive negative resist for laser direct exposure
3. PPA-Litho-project: Resists for new applications in lithography
4. Further CSAR 62 applications – high-precision rectangular structures
5. New results with Electra 92
Resist of the month April 2015: High-sensitivity negative resist AR-N 4400-10
The negative resist AR-N 4400-10 was structured with a laser direct imaging system at an exposure wavelength of 405 nm. The figures below show different arrays with column diameters varying from 5 to 50 µm.
W+M-Artikel: Das Monopol geknackt
Das Strausberger Chemieunternehmen Allresist hat ein langjähriges Monopol geknackt. Sein neuer Hightech-Lack, der Resist CSAR 62, wird bei der Produktion von Mikrochips der neuesten Generation eingesetzt. Die Kunden sind begeistert. Von Dr. Ulrich Conrad.
Fachartikel in der Nanotechnologie (CSAR 62)
Die Fachzeitschrift “Nanotechnologie” schrieb im August 2014 einen interessanten Artikel über die Erfolgsgeschichte unseres CSAR 62.
Resist of the month January 2015: High temperature-resistant positive resist
After the successful development of negative resist SX AR-N 4340/7 which is temperature-stable up to 350 °C, we can now in addition offer a temperature-resistant positive variant called SX AR-PC 3500/8. This resist may be exposed and ..
Fachartikel im Magazin für Oberflächentechnik
Die Fachzeitschrift “Magazin für Oberflächentechnik” hat unserer Neuentwicklung CSAR 62 in ihrer November-Ausgabe 2014 einen langen Artikel gewidmet.
29th issue of the AR NEWS
Content:
1. Opening ceremony of our annex building on time for the 22nd anniversary of Allresist
2. New application results with CSAR 62 (thicker layers)
3. Start of Eurostar project PPA-Litho on 1. November 2014
4. New developments of Allresist