The protective coating AR-PC 504 has proven itself successful many times for our customers in the past six years. Layers of this polymer reliably protect substrates against concentrated bases and acids.
Allresist developed a novel polymer based on polyaniline in cooperation with the IDM e.V., Teltow. The new conductive protective coating SX AR-PC 5000/90.2 was already presented in issue 28 of the AR NEWS.
Content:
1. News about Allresist: Extension for higher production capacities, second-placed entrepreneur
of the Federal State of Brandenburg and Innovation Prize Berlin Brandenburg 2014
2. New Conductive protective coating for e-beam lithography SX AR-PC 5000/90.2
3. E-beam resist SX AR-N 7530/1 for white light applications
4. AR-P 3540 MIF – a resist which can do more! (Progress report by our partners)
5. Allresist on the Semicon China 2014
We already reported in April 2013 on the CSAR 62 within the scope of our “Resist of the month”. After a fast development phase, sales of this new electron beam resist started in May.
Themen im Überblick: Erfolgreiches Jahr 2013 für Allresist ; Gründung des German Innovation Center in Changzhou
; Erfolgreiche Einführung des CSAR 62
; Maskblank-Herstellung in Vorbereitung
; Thermostabile Negativ-Resists
; Leitfähiger Lack für die E-Beam-Lithographie
; Allresist auf der Semicon Europe 2013
Resist of the month October 2013: Thermally stable negative resist SX AR-N 4340/6 Our last resist of the month was the thermally stable two-layer system SX AR-N 4340/10 – AR-P 5460 which reliably tolerates temperatures of up to 200 °C.
Resist of the month July 2013: Thermally stable two-layer system – SX AR-N 4340/10 – AR-P 5460 In a large variety of lift-off applications, the resist layer is exposed to high thermal loads.
Resist of the month April 2013: Positive e-beam resist CSAR 62 – an alternative to ZEP 520 Users cherish the specific properties of ZEP 520, while service and prices are rather feared.
Content:
1. Recognition for the Ludwig Erhard Prize winner Allresist
2. CSAR 62 – the future alternative for the ZEP resist
3. NIR-resist in the development – first successes
Resist of the month January 2013: Negative p hotoresists SX AR-N 4340/8 – a resist for laser interference lithography (LIL) Well-ordered structures across an entire wafer can be produced (see image 3)