Themen im Überblick: Erfolgreiches Jahr 2013 für Allresist ; Gründung des German Innovation Center in Changzhou
; Erfolgreiche Einführung des CSAR 62
; Maskblank-Herstellung in Vorbereitung
; Thermostabile Negativ-Resists
; Leitfähiger Lack für die E-Beam-Lithographie
; Allresist auf der Semicon Europe 2013
Resist of the month October 2013: Thermally stable negative resist SX AR-N 4340/6 Our last resist of the month was the thermally stable two-layer system SX AR-N 4340/10 – AR-P 5460 which reliably tolerates temperatures of up to 200 °C.
Resist of the month July 2013: Thermally stable two-layer system – SX AR-N 4340/10 – AR-P 5460 In a large variety of lift-off applications, the resist layer is exposed to high thermal loads.
Resist of the month April 2013: Positive e-beam resist CSAR 62 – an alternative to ZEP 520 Users cherish the specific properties of ZEP 520, while service and prices are rather feared.
Content:
1. Recognition for the Ludwig Erhard Prize winner Allresist
2. CSAR 62 – the future alternative for the ZEP resist
3. NIR-resist in the development – first successes
Resist of the month January 2013: Negative p hotoresists SX AR-N 4340/8 – a resist for laser interference lithography (LIL) Well-ordered structures across an entire wafer can be produced (see image 3)
Content:
1. 20 years of Allresist – a development from MBO to a business of excellence
2. Successful assessment during a site visit for the Ludwig Erhard Prize
3. VEGAS project submitted
4. Our new developments – first results
Resist of the month October 2012: Negative photoresists AR-N 4400 – with optimized bake regime For the new project VEGAS (see AR NEWS, 25 th issue, October 2012), columnar resist structures with a thickness of 10 to up to 60 µm are required.
Content:
1. Allresist is now employee champion and applies for the Ludwig Erhard price
2. Results of the new e-beam resist AR-N 7520
3. NIR-coatings in development – fist successes
4. Our new developments – first results