Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
Content:
1. Synthesis week in the new production tract
2. Allresist at the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 passed comprehensive application tests
3.1. Dissolution test with the sensitive PAG-Medusa 82 (SX AR-N 8250)
3.2. Influence of a PEB on the sensitivity of Medusa 82
3.3. Plasma etching tests with Medusa structures
3.4. Medusa 82 with specifically low contrast
4. Five coloured negative resists on one glass wafer
Content:
1. 26 years of Allresist – Inauguration of the new plant on the company anniversary
2. Allresist’s great success with Medusa 82 at the MNE 2018
3. Further Allresist highlights at the MNE
4. Atlas 46 and CAR 44 for e-beam lithography
5. Phoenix 81 – World-wide sales begin!
6. Offspring at Allresist – The next generation!
Content:
1. Our building extension is progressing
2. Allresist at the congresses Triple Beam (EIPBN 2018) and MNE 2018
3. Atlas 46 variants for a selective two-layer build-up
4. Fluorescent resists for optics and sensors with Atlas 46 S
5. Medusa 82 – a resist turning into “stone” structures
6. New protective coating for KOH/HF etchings – BlackProtect SX AR-PC 5000/41
Content:
1. 25 years of Allresist – a success story also of resist development
2. Allresist at the MNE Conference with Atlas 46
3. New innovative product developments
3.1. Fluorescent and coloured resists for optics and sensor technologies
3.2. Thick(er) CSAR 62 for the production of deep etch pits
3.3. CSAR 62 in three-layer systems for the generation of T-gates
Content:
1. Allresist is planning a new building extension again in the 25th year of its existence
2. New innovative product developments
3. Scientific partnerships for the MNE 2017
Content:
1. Allresist plans another building extension the in the 25th year of its existence
2. New sales partners
3. Thermally developable positive resist “Phoenix 81“
4. Negative photoresist “Atlas 46“– our effective alternative to SU-8
5. Positive CAR e-beam resist “EOS 72“– our response to FEP 171
6. 25 years of Allresist
Content:
1. 24th anniversary of Allresist
2. Allresist as silver sponsor at MNE 2016 in Vienna
3. News about CSAR 62 and Electra 92
4. Optimised T-gate structures with three-layer system of PMMA, copolymer 617, and CSAR 62
5. New developers for PMMAcoMA (AR-P 617, 50 kV)
6. New lab and new rotary evaporator for production
Content:
1. Allresist in the 24th year: A steady upswing with innovations
2. Electra 92 as conductive layer for SEM-imaging
3. Poly(phthalaldehyde) (PPA) as e-beam resist
4. Conductive polymer electrodes for stack actuators – smart3
5. Polyphotonics – new resists for optical components and applications in microelectronics
Content:
1. Innovative new developments presented on the MNE 2015 and the SEMICON Europe:
A case for two – CSAR 62 & Electra 92
2. Alternative to Espacer Electra 92 meets user expectations
2.1 Long shelf life of Electra 92
2.2 CSAR structures on glass, made possible due to Electra 92
2.3 PMMA lift-off structures on semi-precious stone substrates with Electra 92
2.4 Electra 92 for applications on novolac-base resists –
New variant SX AR-PC 5000/91.1 for negative CAR AR-N 7700 on glass
3. PPA-Litho project: First application examples of the new PPA resists
4. Allresist turns 23 years old and rejuvenates
5. Chemnitz seminar “Electron-Beam Lithography“ in the Fraunhofer Institute ENAS