Content:
1. Investment in sun energy – Allresist installed a rooftop photovoltaic system
2. Highly sensitive negative resist for laser direct exposure
3. PPA-Litho-project: Resists for new applications in lithography
4. Further CSAR 62 applications – high-precision rectangular structures
5. New results with Electra 92
Content:
1. Opening ceremony of our annex building on time for the 22nd anniversary of Allresist
2. New application results with CSAR 62 (thicker layers)
3. Start of Eurostar project PPA-Litho on 1. November 2014
4. New developments of Allresist
Content:
1. News about Allresist: Extension for higher production capacities, second-placed entrepreneur
of the Federal State of Brandenburg and Innovation Prize Berlin Brandenburg 2014
2. New Conductive protective coating for e-beam lithography SX AR-PC 5000/90.2
3. E-beam resist SX AR-N 7530/1 for white light applications
4. AR-P 3540 MIF – a resist which can do more! (Progress report by our partners)
5. Allresist on the Semicon China 2014
Themen im Überblick: Erfolgreiches Jahr 2013 für Allresist ; Gründung des German Innovation Center in Changzhou
; Erfolgreiche Einführung des CSAR 62
; Maskblank-Herstellung in Vorbereitung
; Thermostabile Negativ-Resists
; Leitfähiger Lack für die E-Beam-Lithographie
; Allresist auf der Semicon Europe 2013
Content:
1. Recognition for the Ludwig Erhard Prize winner Allresist
2. CSAR 62 – the future alternative for the ZEP resist
3. NIR-resist in the development – first successes
Content:
1. 20 years of Allresist – a development from MBO to a business of excellence
2. Successful assessment during a site visit for the Ludwig Erhard Prize
3. VEGAS project submitted
4. Our new developments – first results
Content:
1. Allresist is now employee champion and applies for the Ludwig Erhard price
2. Results of the new e-beam resist AR-N 7520
3. NIR-coatings in development – fist successes
4. Our new developments – first results