Allresist at the EIPBN 2018 Conference in Puerto Rico

Allresist attended the “triple-beam” conference EIPBN 2018 for the first time. Matthias Schirmer and Dr. Christian Kaiser answered many inquiries at the exhibition stand, especially questions regarding electron beam resists.

37th issue of the AR NEWS

Content:

1. Our building extension is progressing
2. Allresist at the congresses Triple Beam (EIPBN 2018) and MNE 2018
3. Atlas 46 variants for a selective two-layer build-up
4. Fluorescent resists for optics and sensors with Atlas 46 S
5. Medusa 82 – a resist turning into “stone” structures
6. New protective coating for KOH/HF etchings – BlackProtect SX AR-PC 5000/41

Resist of the month of April: Fluorescent negative photoresist Atlas 46 S

These poly(phthalaldehydes) are also suitable for electron beam lithography and for the fabrication of 200 nm thick fibers (electrospinning). The material produced from these threads evaporates immediately upon heating, which offers interesting application possibilities.

Resist of the month January: SU 8 alternative – negative photoresist Atlas 46

The outstanding properties of SU-8 are well known to all users of microsystem technologies. Allresists new negative resist Atlas 46 S (solid) can easily be processed with high reproducibility of all properties and with high restistance of resist structures to all commonly used solvents. Atlas 46 S is thus perfectly suitable for all applications in which the layer is intended to remain permanently and resistively on the substrate.

Zeitungsartikel zu 25 Jahren Allresist

Das 25-jährige Bestehen feierte das Team der Allresist GmbH im Rahmen einer großen Feierlichkeit. Zu diesem Anlass haben die regionalen Zeitungen ausführliche Berichte über das erfolgreiche Unternehmen veröffentlicht.

36th Issue of the AR NEWS

Content:
1. 25 years of Allresist – a success story also of resist development
2. Allresist at the MNE Conference with Atlas 46
3. New innovative product developments
3.1. Fluorescent and coloured resists for optics and sensor technologies
3.2. Thick(er) CSAR 62 for the production of deep etch pits
3.3. CSAR 62 in three-layer systems for the generation of T-gates

25 years of Allresist – A reason to celebrate!

In the quarter century of its existence, the Allresist Company established a solid place on the world market and an excellent reputation among its customers. We thus appropriately celebrated our company anniversary on 16 October 2017 with a festive event!

Innovative new development at the MNE 2017

Allresist participated in the conference as a “silver sponsor” with an own large stand and presented many remarkable new developments. A particular highlight was our scientific poster on our new development AR-N 4600 (now Atlas 46) and the lecture by Dr. Gerngroß about this interesting negative photoresist.

35th special issue of the AR NEWS

Content:
1. Allresist is planning a new building extension again in the 25th year of its existence
2. New innovative product developments
3. Scientific partnerships for the MNE 2017

Resist of the month of October: Fluorescent resist structures with SX AR-P 672.08

Fluorescent structures are needed for optical components and in microscopy. In close collaboration with Precision Optics Gera GmbH we now achieved to add fluorescent dyes to PMMA e-beam resists on anisole basis which subsequently could be structured by electron beam lithography.