34th issue of the AR NEWS

Content:
1. Allresist plans another building extension the in the 25th year of its existence
2. New sales partners
3. Thermally developable positive resist “Phoenix 81“
4. Negative photoresist “Atlas 46“– our effective alternative to SU-8
5. Positive CAR e-beam resist “EOS 72“– our response to FEP 171
6. 25 years of Allresist

Resist of the month April – Thermally developable positive resist Phoenix 81

These poly(phthalaldehydes) are also suitable for electron beam lithography and for the fabrication of 200 nm thick fibers (electrospinning). The material produced from these threads evaporates immediately upon heating, which offers interesting application possibilities.

Allresist now offers many solvents in lightweight HDPE bottles

Many solvents and process chemicals will become “lighter” in the future. Allresist now offers these products in HDPE instead of glass bottles.

Resist of the month January 2017: Optimised negative spray resist AR-N 2200

Spray resist AR-N 2220 is the only ready-to-use negative resist worldwide. This eliminates the need for the time-consuming and inaccurate mixing of a resist with solvents.

33rd issue of the AR NEWS

Content:
1. 24th anniversary of Allresist
2. Allresist as silver sponsor at MNE 2016 in Vienna
3. News about CSAR 62 and Electra 92
4. Optimised T-gate structures with three-layer system of PMMA, copolymer 617, and CSAR 62
5. New developers for PMMAcoMA (AR-P 617, 50 kV)
6. New lab and new rotary evaporator for production

Resist of the month October 2016: Optimised T-gate structures with three-layer system PMMA, copolymer 617 and CSAR 62

T-gates are required for the manufacture of high-quality transistors. Allresist optimised several three-layer systems for this particular application and designed both universal developers for a single development step, as well as individual developers which are suitable to develop each one of the three layers specifically.

Resist of the month July 2016: Negative PMMA resist for photolithography

Sensitive substrates do not tolerate aqueous-alkaline developers. For such cases, X AR-N 4800/16 was developed already several years ago. While this resist met all the demands placed on it, only a layer build up to 70 % with moderate sensitivity was possible.

32nd issue of the AR NEWS

Content:
1. Allresist in the 24th year: A steady upswing with innovations
2. Electra 92 as conductive layer for SEM-imaging
3. Poly(phthalaldehyde) (PPA) as e-beam resist
4. Conductive polymer electrodes for stack actuators – smart3
5. Polyphotonics – new resists for optical components and applications in microelectronics

Resist of the month January 2016: Electra 92 has now gone into production!

Electra 92 has passed its baptism of fire by the users very well, and an increasingly large number of satisfied customers provided positive feedbacks with respect to the excellent properties of resist AR-PC 5090.02.

31st issue of the AR NEWS

Content:
1. Innovative new developments presented on the MNE 2015 and the SEMICON Europe:
A case for two – CSAR 62 & Electra 92
2. Alternative to Espacer Electra 92 meets user expectations
2.1 Long shelf life of Electra 92
2.2 CSAR structures on glass, made possible due to Electra 92
2.3 PMMA lift-off structures on semi-precious stone substrates with Electra 92
2.4 Electra 92 for applications on novolac-base resists –
New variant SX AR-PC 5000/91.1 for negative CAR AR-N 7700 on glass
3. PPA-Litho project: First application examples of the new PPA resists
4. Allresist turns 23 years old and rejuvenates
5. Chemnitz seminar “Electron-Beam Lithography“ in the Fraunhofer Institute ENAS