Electra 92 has passed its baptism of fire by the users very well, and an increasingly large number of satisfied customers provided positive feedbacks with respect to the excellent properties of resist AR-PC 5090.02.
Content:
1. Innovative new developments presented on the MNE 2015 and the SEMICON Europe:
A case for two – CSAR 62 & Electra 92
2. Alternative to Espacer Electra 92 meets user expectations
2.1 Long shelf life of Electra 92
2.2 CSAR structures on glass, made possible due to Electra 92
2.3 PMMA lift-off structures on semi-precious stone substrates with Electra 92
2.4 Electra 92 for applications on novolac-base resists –
New variant SX AR-PC 5000/91.1 for negative CAR AR-N 7700 on glass
3. PPA-Litho project: First application examples of the new PPA resists
4. Allresist turns 23 years old and rejuvenates
5. Chemnitz seminar “Electron-Beam Lithography“ in the Fraunhofer Institute ENAS
Die Fachzeitschrift “Nanotechnologie” schrieb im Oktober 2015 einen interessanten Artikel über die Erfolgsgeschichte unseres Electra 92.
Allresist presented this precise and easy to handle two-layer system already on the MNE (Micro and Nano Engineering) 2015 in Den Haag with great success.
The bottom resist AR-BR 5460 has already been used for a decade in combination with positive (e.g. AR-P 3510) or negative resists (e.g. AR-N 4340) for a large variety of lift-off applications.
Content:
1. Investment in sun energy – Allresist installed a rooftop photovoltaic system
2. Highly sensitive negative resist for laser direct exposure
3. PPA-Litho-project: Resists for new applications in lithography
4. Further CSAR 62 applications – high-precision rectangular structures
5. New results with Electra 92
The negative resist AR-N 4400-10 was structured with a laser direct imaging system at an exposure wavelength of 405 nm. The figures below show different arrays with column diameters varying from 5 to 50 µm.
Das Strausberger Chemieunternehmen Allresist hat ein langjähriges Monopol geknackt. Sein neuer Hightech-Lack, der Resist CSAR 62, wird bei der Produktion von Mikrochips der neuesten Generation eingesetzt. Die Kunden sind begeistert. Von Dr. Ulrich Conrad.
Die Fachzeitschrift “Nanotechnologie” schrieb im August 2014 einen interessanten Artikel über die Erfolgsgeschichte unseres CSAR 62.
After the successful development of negative resist SX AR-N 4340/7 which is temperature-stable up to 350 °C, we can now in addition offer a temperature-resistant positive variant called SX AR-PC 3500/8. This resist may be exposed and ..