July 2021: CAR 44 for galvanic molding
The successful evaluation of our development at one of our largest customers was the reason for us to select AR-N 4400-50 as resist of the month of July.
April 2021: CSAR 62 – In demand around the world
Resist CSAR 62 is meanwhile established worldwide, with continuously increasing demands. Since we manufacture the polymer by ourselves, we had to scale up polymer synthesis. First of all, CSAR 62 made the jump from laboratory scale to a 20-liter trailer.
January 2021: Optimised process for negative photoresist Atlas 46
We continued the development work on our new Atlas 46 photoresist also in 2021. Due to own results or recommendations and requests from our users, its formulation and properties were now improved.
July 2020: Bottom resist AR-BR 5400, the “workhorse” for two-layer processes
In 2004, the first bottom resist (BR) was developed in collaboration with the Center for Intelligent Systems (CiS, Erfurt). This bottom resist is non-light sensitive and can be developed in an aqueous alkaline manner.
January 2020: Black resist SX AR-N 8355/7
Optically dense resists play an increasingly important role in industry. So-called black resists are required in optical industry, in automotive industry (for headlights) and in the manufacture of rotary encoders.
Oktober 2019: Medusa 82 UV
Medusa 82 UV was already chosen as resist of the month in January 2019. Back then, we highly appreciated the first results for a use as photoresist. Shown are now results with respect to an application in grayscale lithography which were also presented at the MNE 2019 in Greece.
April 2019: Phoenix 81
Allresist developed Phoenix 81 (AR-P 8100) within the scope of a Eurostars project together with SwissLitho AG and other partners. SwissLitho recently added a laser direct writer to the NanoFrazor device (see Fig. 1)
Resist of the Month of October: Medusa 82 – alternative to HSQ
Allresist now developed Medusa 82 as an alternative to HSQ resists. Due to a modification of the polymer, resist Medusa 82 can be handled very easily.
Resist of the Month July: Medusa 82 – the alternative to HSQ-resists
Our research team successfully developed a negative resist with high resolution and plasma etching stability in oxygen. Already with the first samples, it was possible to achieve the properties of HSQ.
Resist of the month of April: Fluorescent negative photoresist Atlas 46 S
These poly(phthalaldehydes) are also suitable for electron beam lithography and for the fabrication of 200 nm thick fibers (electrospinning). The material produced from these threads evaporates immediately upon heating, which offers interesting application possibilities.