Electra 92 has passed its baptism of fire by the users very well, and an increasingly large number of satisfied customers provided positive feedbacks with respect to the excellent properties of resist AR-PC 5090.02.
Allresist presented this precise and easy to handle two-layer system already on the MNE (Micro and Nano Engineering) 2015 in Den Haag with great success.
The bottom resist AR-BR 5460 has already been used for a decade in combination with positive (e.g. AR-P 3510) or negative resists (e.g. AR-N 4340) for a large variety of lift-off applications.
The negative resist AR-N 4400-10 was structured with a laser direct imaging system at an exposure wavelength of 405 nm. The figures below show different arrays with column diameters varying from 5 to 50 µm.
After the successful development of negative resist SX AR-N 4340/7 which is temperature-stable up to 350 °C, we can now in addition offer a temperature-resistant positive variant called SX AR-PC 3500/8. This resist may be exposed and ..
The protective coating AR-PC 504 has proven itself successful many times for our customers in the past six years. Layers of this polymer reliably protect substrates against concentrated bases and acids.
Allresist developed a novel polymer based on polyaniline in cooperation with the IDM e.V., Teltow. The new conductive protective coating SX AR-PC 5000/90.2 was already presented in issue 28 of the AR NEWS.
We already reported in April 2013 on the CSAR 62 within the scope of our “Resist of the month”. After a fast development phase, sales of this new electron beam resist started in May.
Resist of the month October 2013: Thermally stable negative resist SX AR-N 4340/6 Our last resist of the month was the thermally stable two-layer system SX AR-N 4340/10 – AR-P 5460 which reliably tolerates temperatures of up to 200 °C.
Resist of the month July 2013: Thermally stable two-layer system – SX AR-N 4340/10 – AR-P 5460 In a large variety of lift-off applications, the resist layer is exposed to high thermal loads.