Resist of the month April 2013: Positive e-beam resist CSAR 62 – an alternative to ZEP 520 Users cherish the specific properties of ZEP 520, while service and prices are rather feared.
Resist of the month January 2013: Negative p hotoresists SX AR-N 4340/8 – a resist for laser interference lithography (LIL) Well-ordered structures across an entire wafer can be produced (see image 3)
Resist of the month October 2012: Negative photoresists AR-N 4400 – with optimized bake regime For the new project VEGAS (see AR NEWS, 25 th issue, October 2012), columnar resist structures with a thickness of 10 to up to 60 µm are required.