Resist für die Startseite (Resist des Monats)

October 2021: More efficient production of Electra 92

Many companies meanwhile use the conductivity of Electra layers for their processes and technologies. Since its introduction on the market in 2018, synthesis and processing of Electra have continuously been improved. The conductivity of this resist could for example be increased by a factor of five between 2018 and 2020.

July 2021: CAR 44 for galvanic molding

The successful evaluation of our development at one of our largest customers was the reason for us to select AR-N 4400-50 as resist of the month of July.

April 2021: CSAR 62 – In demand around the world

Resist CSAR 62 is meanwhile established worldwide, with continuously increasing demands. Since we manufacture the polymer by ourselves, we had to scale up polymer synthesis. First of all, CSAR 62 made the jump from laboratory scale to a 20-liter trailer.

January 2021: Optimised process for negative photoresist Atlas 46

We continued the development work on our new Atlas 46 photoresist also in 2021. Due to own results or recommendations and requests from our users, its formulation and properties were now improved.

July 2020: Bottom resist AR-BR 5400, the “workhorse” for two-layer processes

In 2004, the first bottom resist (BR) was developed in collaboration with the Center for Intelligent Systems (CiS, Erfurt). This bottom resist is non-light sensitive and can be developed in an aqueous alkaline manner.

January 2020: Black resist SX AR-N 8355/7

Optically dense resists play an increasingly important role in industry. So-called black resists are required in optical industry, in automotive industry (for headlights) and in the manufacture of rotary encoders.

Oktober 2019: Medusa 82 UV

Medusa 82 UV was already chosen as resist of the month in January 2019. Back then, we highly appreciated the first results for a use as photoresist. Shown are now results with respect to an application in grayscale lithography which were also presented at the MNE 2019 in Greece.

Resist of the Month July: Medusa 82 – the alternative to HSQ-resists

Our research team successfully developed a negative resist with high resolution and plasma etching stability in oxygen. Already with the first samples, it was possible to achieve the properties of HSQ.

Resist of the month of April: Fluorescent negative photoresist Atlas 46 S

These poly(phthalaldehydes) are also suitable for electron beam lithography and for the fabrication of 200 nm thick fibers (electrospinning). The material produced from these threads evaporates immediately upon heating, which offers interesting application possibilities.