Resist of the month October 2015: E-beam lithography on glass – CSAR 62 and Electra 92
Allresist presented this precise and easy to handle two-layer system already on the MNE (Micro and Nano Engineering) 2015 in Den Haag with great success.
Resist für die Startseite (Resist des Monats)
Resist of the month Juli 2015: Process-adapted two-layer resist AR-BR 5460
The bottom resist AR-BR 5460 has already been used for a decade in combination with positive (e.g. AR-P 3510) or negative resists (e.g. AR-N 4340) for a large variety of lift-off applications.
Resist of the month April 2015: High-sensitivity negative resist AR-N 4400-10
The negative resist AR-N 4400-10 was structured with a laser direct imaging system at an exposure wavelength of 405 nm. The figures below show different arrays with column diameters varying from 5 to 50 µm.