Long-term stability of Electra 92

To assess the long-term stability of Electra 92 (SX AR-PC 5000/90.2), two reference samples were coated on glass (300 rpm, 3 min, softbake at 85 °C for 30 min in the oven) after different storage times of 15 months and 3 months, respectively (refrigerator, 8 °C).

Poly(phthalaldehyde)-based electron beam resists

A direct positive patterning of PPA layers is possible by electron bombardment. Similar to the irradiation of normally used e-beam resists like e.g. CSAR 62 or PMMA, the electron beam causes a fragmentation of the polymer chains.

Resists for novel applications in lithography – thermally structurable polymers

Within the scope of the Eurostar project PPA-Litho, Allresist currently evaluates innovative high-quality resists on poly(phthalaldehyde) (PPA) basis in cooperation with the company Aglycon, the Joanneum Research in Weiz, and the SwissLitho AG in Zurich.

Patterning of the conductive protective coating Electra 92

A negative resist (e.g. AR-N 4340) is coated onto the substrate, exposed, and developed. The exposure dose should be chosen as small as possible to provide the desired slight undercut which supports the later lifting.

High resolution on quartz with Electra 92 on HSQ resists

An accurate patterning on quartz substrates is not possible without the use of a conductive coating. Investigations of the company Raith GmbH demonstrated that an HSQ resist XR1541 on a quartz substrate can be patterned with very high quality after coating with Electra 92.