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You are here: Resist Wiki1 / Photoresist2 / General

General: Resist composition

The resists most widely used by far are the positive photo resists, followed by negative photo resists. However, there are other special resists as well.
Image reversal resists are positive resists with an additional amine. Depending on the manufacturing process, positive or negative images can be generated.

https://www.allresist.com/wp-content/uploads/sites/2/2020/02/logo_allresist_en.png 0 0 https://www.allresist.com/wp-content/uploads/sites/2/2020/02/logo_allresist_en.png 2022-06-01 11:20:072022-06-01 11:22:49General: Resist composition

Lift off (one layer – two layer)

Two procedures are principally possible to manufacture e.g. conducting paths: 1. Etching technique: A thin metal film (e.g. aluminium) is deposited on a wafer (evaporation or sputtering)

https://www.allresist.com/wp-content/uploads/sites/2/2020/02/logo_allresist_en.png 0 0 AllAdmin https://www.allresist.com/wp-content/uploads/sites/2/2020/02/logo_allresist_en.png AllAdmin2012-07-13 12:54:592022-06-16 12:26:28Lift off (one layer – two layer)

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Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.

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Allresist GmbH

Am Biotop 14
15344 Strausberg

Germany

Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29

E-Mail: info(a)allresist.de

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