Negative CAR PMMA resist SX AR-N 4810/1

The principle of chemical amplification could successfully be transferred to PMMA polymers. The new special resist SX AR-N 4810/1 is a chemically amplified photoresist based on PMMA that can be developed anhydrously with organic solvents – a crucial property in the case of moisture-sensitive substrates.

Aqueous negative resist based on gelatine

In the presence of catalytic iron salts, it is possible to photochemically induce a negative crosslinking of gelatine. Coated substrates are for this purpose exposed and briefly swivelled in diluted hydrogen peroxide solution which acts as crosslinking agent.