Photoresist coatings on Teflon substrates

Teflon or similar products are, due to their extreme surface properties, utilised for applications in which a structuring of the Teflon is sometimes desirable. The hydrophobic surface properties however impede the coating with resist,

Spray resists for different topologies (positive and negative)

Spray resists available to date (AZ 4999) are designed for extreme topologies, which means that even vertical silicon trench sidewalls can be covered with resist. These excellent features however come at a price:

Resist for 488 nm exposure wavelength

General exposure wavelengths for broadband UV-lithography are in a range between 300 nm and 450 nm, which includes the important lines of high-pressure mercury lamp at 436 nm (g-line).