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Data sheet for new customer
As a new customer, we cordially invite you to fill out the linked data sheet for new customer. Many Thanks!
Our products
You can find a lot of useful information about our products on the detailed product pages and the product information as PDF:
Photoresist AR-N 2200 series
Ready-to-use negative spray resists for various applications
Photoresist AR-N 4340 (CAR)
Highly sensitive negative resist for the production of integrated circuits
Photoresist AR-N 4400 series
Thick and very thick negative resists for electroplating, microsystem technology and LIGA
Photoresist AR-N 4600 series (Atlas 46)
Thick negative resists for electroplating, microsystems technologies and LIGA < 20 μm
E-Beam Resist AR-N 7520 new series
Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C
E-Beam Resist AR-N 7520 series
High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C
E-Beam Resist AR-N 8400 series (Medusa 84 SiH)
HSQ with improved stability and shelf life
E-Beam Resist AR-P 617 series
Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol
Protective Coating AR-PC 5040
Wafer backside protection during front side etchings for the production of deep structures in silicon
Protective Coating AR-PC 5090.02 (Electra 92)
Conductive protective coating for non-novolak-based e-beam resists Top layer for the dissipation of e-beam charges on insulating substrates
Protective Coating AR-PC 5092.02 (Electra 92)
Conductive protective coating for e-beam resists. Top layer for the dissipation of e-beam charges on insulating substrates.
Protective Coating AR-PC 5094.02 (Electra 94)
Conductive protective coating as all-rounder for e-beam resists. Top layer for the dissipation of e-beam charges on insulating substrates.
Adhesion Promoter AR 300-80 new
For improving the adhesive strength of photo and e-beam resists
Developer AR 300-26
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-35
For the development of photoresists and novolac-based e-beam resist films
Developer AR 300-44
For the development of photoresists and novolac-based e-beam resist films
Resist Wiki
A visit to our Resist Wiki could also be worthwhile. New applications, theoretical backgrounds and practical tips are presented here.
Aluminium structures developed directly
The fabrication of aluminium structures generally involves the production of a resist mask with subsequent wet-chemical etching. The more elegant procedure of direct development can be applied if the negative resist SX AR-
27. February 2013/by AllAdminChemical dry etching
Chemical dry etchings fall into two categories depending on the etching principle. 1. A more chemical etching refers to a process in which the substrate is attacked by radicals and converted into volatile compounds.
31. August 2012/by AllAdminComposition of photoresists
Photoresists are particularly employed in microelectronics and in microsystems technology to generate µm- and sub-µm structures.
13. July 2012/by AllAdminCross linker
The patterning of negative resists is based on the stabilization of exposed areas in the presence of cross-linking agents. Radical starters like e.g. azo-bis(isobutyronitrile) (AIBN)
13. July 2012/by AllAdmin1. What are photoresists composed of, and how do they work?
Photoresists (also photo coatings) are primarily used in micro electronics and micro system technologies for the production of µm- and sub-µm structures. These resists are generally deposited by spin coating in a range between 250
21. August 2008/by AllAdmin10. Which developers are optimal for photoresist, and how do factors like developer concentration and temperature influence the result?
During development, a positive tone resist film is structured by a removal of exposed areas, while unexposed areas are removed when negative resists are used. To achieve reproducible results,
12. August 2008/by AllAdmin11. How can resist coatings be removed again?
For the removal of softbaked coatings, polar solvents such as e.g. the respective resist thinner AR 300-12 (methoxy propyl acetate = PGMEA) and the remover AR 600-70 (acetone-based)
11. August 2008/by AllAdmin12. What is the application range of protective coatings?
Protective coatings are available for a large variety of applications, e.g. for the protection of wafer-backsides: or mechanical protection during transport
10. August 2008/by AllAdmin1. What are e-beam resists composed of, and how do they work?
E-beam resists (electron beam resists) are designed for electron beam and deep UV applications for the fabrication of highly integrated circuits, mainly for mask fabrication. They are employed in electron beam direct writing and multilayer processes.
23. August 2008/by AllAdmin10. How high is the etch resistance of e-beam resists in the presence of strong acids?
Concentrated oxidising acids (sulphuric acid, nitric acid, aqua regia 1) , piranha 2) ) attack resist films already at room temperatures and are often used as remover for persistent resist structures.
14. August 2008/by AllAdmin11. How high is the solvent resistance of e-beam resist films?
With respect to the source materials used, e-beam resists fall into two different categories: PMMA resists (AR-P 6000) Novolak resists (AR-N/P 7000) » The general rule is that with increasing bake-
13. August 2008/by AllAdmin2. For how long are e-beam resists stable, and what are the optimal storage conditions?
PMMA- and copolymer e-beam resists are not light-sensitive in the visible UV range, they consequently don’t react to light exposure (no safe yellow light required) and are substantially less temperature-
22. August 2008/by AllAdminBlack-Protect – stable protective coating for HF and KOH etchings
Allresist offers the protective coating SX AR-PC 5000/40 for HF and KOH etchings already for a few years. Layers of 5 μm are able to withstand a 48 % hydrofluoric acidic solution for several hours. Also 40 % KOH solutions for silicon etchings do not attack the layer.
9. July 2018/by AllAdminImproved protective coating SX AR-PC 5000/31
Protective coatings are in most cases composed of novolacs or PMMA polymers. Both polymers ensure a sufficiently high protective effect against mechanical damages as well as sufficiently high resistance against acidic solutions.
13. June 2014/by AllAdminPMMA protective coating: reduction of cotton candy effect
Since problems may occur when PMMA protective coatings are applied, new ideas emerged how to optimise the coating properties of these resists. So far, protective coatings tend to show under certain circumstances the so-called "cotton candy effect" during spin coating, which means that fine PMMA threads are formed.
27. October 2014/by AllAdminProtective coating as spray resist for the smoothing of surfaces
PMMA layers (novolak layers) feature an extremely smooth surface. A surface roughness of less than 2nm was measured on resists which were thus optimized. This characteristic can be used for the smoothing of glass surfaces, for instance.
22. March 2022/by 2L-Lift-off system AR-P 617 – AR-P 8100
Anisole PPA solutions can be coated on PMMAcoMA 33 (AR-P 617). The single layers add up in this case; no mixing of layers occurs, which is a decisive prerequisite to realise defined 2- or also 3-layer systems.
25. April 2018/by AllAdminManufacture of undercut structures for T-gates in three-layer processes
In principle, several options exist to develop three-layer systems for the manufacture of T-gates. It is however crucial in each case that the different resists do not mix during the coating in order to ensure a coherent and well-defined layer build-up. AR-P 617 can be coated onto all PMMAs (50k - 950k) without any problems, since the resist solvent does not attack PMMAs. Vice versa can AR-P 617 also be coated with PMMA solutions in ethyl lactate or also anisole.
29. September 2016/by AllAdminTwo-layer e-beam resist system with novolacs as bottom resist
For multi-layer applications in e-beam lithography, Allresist offers the highly versatile bottom resist AR-BR 5460/5480. The removal rates of the bottom layer can easily be specifically adjusted by slightly changing the softbake temperature and the developer strength.
19. January 2016/by AllAdminUse of PPA in multilayer processes
Anisolic PPA solutions can be coated onto PMMA (600k, 950k), PMMAcoMA (AR-P 617) as well as on bottom resist AR-BR 5480 (alternative to PMGI). The single layers add up in each case, and virtually no mixing takes place. It is thus possible to realize well-defined two- and three-layer systems by these means.
20. January 2017/by AllAdminAdditional new experimental developers for AR-P 617
For some applications are universal developers of advantage, i.e. developers which are simultaneously well suited for a variety of resist families. Multilayer systems can in this case be developed in one step, and no change of the developer in between is required.
29. September 2016/by AllAdminAdhesion promoter HMDS and diphenylsilanediol (AR 300-80)
The adhesion of resists to different substrates varies. Many substrates like e.g. silicon, silicon nitride and base metals (like aluminium, copper) show generally good resist adhesion features,
28. February 2013/by AllAdminAdhesive strength of AR 300-80
In order to prevent the above described stripping of the PMMA layer from the wafer, the use of adhesion promoters is strongly recommended. Helpful is also a tempering of the wafers at maximum temperature (if possible > 200°C)
7. October 2013/by AllAdminAgeing of developer
Aqueous-alkaline developers are subjected to ageing, due to an uptake of CO 2 from the air. Buffered aqueous-alkaline developers ( AR 300-26, -35 ) are more stable in this respect than developers of the AR 300-40 -series containing TMAH.
13. July 2012/by AllAdminCustomer Consulting
If you have any technical questions, requests for product adjustments or sample shipments, please contact our customer advisors.
Dr. Mandy Sendel
Customer Advisor
Phone: +49 3341 35 93 - 21
Email: mandy.sendel@allresist.de
Quality Promise
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
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Contact
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de