Resist of the Month January 2021: Optimised process for negative photoresist Atlas 46
We continued the development work on our new Atlas 46 photoresist also in 2021. Due to own results or recommendations and requests from our users, its formulation and properties were now improved. So far, we offered this resist in two variants: the Atlas 46 R series is easy to remove after structuring, the Atlas 46 S series is very stable. Upon closer examination of the process parameters, it turned out that both increased resistance and relatively easy removal can be achieved with one resist alone. In cooperation with the IFW Dresden, a comprehensive evaluation of the Atlas 46 properties is soon about to be completed. The summarized results will be presented shortly, but we would like to demonstrate a two-layer structure of the improved Atlas 46 already in advance:
Fig. Atlas 46 two-layer system with 10 µm lines & spaces
We will thus now only offer Atlas 46 as a universal AR-N 4600 in the future, and this prompted us to choose Atlas 46 as resist of the month of January.