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Developer AR 300-26

For the development of photoresists and novolac-based e-beam resist films

Characterisation

  • buffered, colourless aqueous-alkaline solutions for photoresist development with low dark erosion
  • AR 300-26 high contrast, steep edges, fast development, particularly suited for thick films

Interesting Resist Wiki articles

Properties

  • main component(s)
    Natriumborat und NaOH
  • Application / conditions
    Tauch-, Puddle-, Sprühentwicklung
  • Normality (n)
    1,10 n

Available order sizes

  • 1 x 2.5 L
  • 4 x 2.5 L
  • 1 x 5 L
  • 4 x 5 L
  • 20 x 5 L

Please contact us for further requests.

Suitable products

Photoresist AR-N 4340 (CAR)

Highly sensitive negative resist for the production of integrated circuits

Photoresist AR-P 3100 series

Adhesion-enhanced positive resists for the production of masks and fine scale divisions

Photoresist AR-P 3200 series

Thick positive resists for electroplating and microsystems technology

Photoresist AR-P 3500 (T) series

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3740

Sensitive positive-tone standard resists for the production of highly integrated circuits

Photoresist AR-P 5300 series

Sensitive resists for the production of vapour deposition patterns by lift-off

Photoresist SX AR-N 4340/7

Negative photoresist for one- and two-layer systems, thermostable up to 300 °C

Protective Coating SX AR-PC 5000/41

KOH and HF resistant protective coating for wafer backside protection

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