Developer AR 300-26

For the development of photoresists and novolac-based e-beam resist films

Product information

Your request for this product

Characterisation

buffered, colourless aqueous-alkaline solutions for photoresist development with low dark erosion
AR 300-26 high contrast, steep edges, fast development, particularly suited for thick films

Interesting Resist Wiki articles

20. May 2015

Alkaline developers for aluminium substrates

20. May 2015

New developer for AR-P 5320

7. October 2013

Adhesive strength of AR 300-80

27. February 2013

Positive polyimide one-layer resist

13. July 2012

Ageing of developer

Properties

main component(s)
Natriumborat und NaOH
Application / conditions
Tauch-, Puddle-, Sprühentwicklung
Normality (n)
1,10 n

Available order sizes

1 x 2.5 L
4 x 2.5 L
1 x 5 L
4 x 5 L
20 x 5 L

Please contact us for further requests.

Suitable products

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Protective Coating SX AR-PC 5000/41

KOH and HF resistant protective coating for wafer backside protection

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