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Developer AR 600-548

For the development of e-beam resists films

Characterisation

  •  ultrapure, ultra-filtered (0.2 μm) solvent mixtures
  • storage at 10-22 °C for 6 month
  • Main component(s): diethyl ketone /diethyl malonate

Interesting Resist Wiki articles

Properties

  • Density at 20 °C (g/cm3)
    0,917 g/cm³
  • Refractive index at 20 °C
    1,401
  • Water content max. (%)
    0,1 %
  • Flash point (°C)
    22 °C

Available order sizes

  • 1 x 1 L

Please contact us for further requests.

Suitable products

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

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