Developer AR 600-55

For the development of e-beam resists films

Product information

Your request for this product

Characterisation

ultrapure, ultra-filtered (0.2 μm) solvent mixtures
storage at 10-22 °C for 6 month
Main component(s): methyl isobutylketone (MIBK)

Interesting Resist Wiki articles

Properties

Density at 20 °C (g/cm3)
0,792 g/cm³
Refractive index at 20 °C
1,384
Water content max. (%)
0,1 %
Flash point (°C)
12 °C

Available order sizes

1 x 1 L

Please contact us for further requests.

Suitable products

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

AR News Newsletter

AR NEWS