You are here: / / / / / Developer X AR 600-50/2

Developer X AR 600-50/2

High-purity and ultra-fine filtered developer for selective T-gate applications

Characterisation

  • ultrapure, ultra-filtered (0.2 μm) solvent mixture
  •  storage at 10-22 °C for 6 month
  • Main component(s): Ethanol

Interesting Resist Wiki articles

Properties

  • Refractive index at 20 °C
    1,366
  • Flash point (°C)
    12 °C

Available order sizes

  • 1 x 1.000 ml

Please contact us for further requests.

Suitable products

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

    Product Request

    *Name

    *Company/Institute

    *E-Mail

    *Subject

    *Your Message