E-Beam Resist SX AR-N 8250 series (Medusa 82)
(SX AR-N 8250.03, SX AR-N 8250.06, SX AR-N 8250.18)
Experimental sample/custom-made product
Characterisation
- high-resolution e-beam resist, also sensitive in EUV (13.5 nm) and DUV (250 nm) range
- comparable to HSQ, but with by a factor of 20 higher sensitivity, easier to remove
- considerably higher shelf life
- silsesquioxane and acid generator dissolved in 1-methoxy-2-propanol
Properties
SX AR-N 8250.03
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Film thickness/4000 rpm: 50 nm
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Resolution best value: 15 nm
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Contrast: 8
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Flash point: 38 °C
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Storage 6 month: 8-12 °C
SX AR-N 8250.06
SX AR-N 8250.18
Available order sizes
- 1x 30 ml (experimental sample)
- 1 x 100 ml
- 1 x 250 ml
- 1 x 1000 ml
Please contact us for further requests.
Suitable process chemicals
Resist structures
Medusa 82 UV structure with higher sensitivity
Medusa product presentation
