You are here: / / / E-Beam Resist SX AR-N 8250 series (Medusa 82)

E-Beam Resist SX AR-N 8250 series (Medusa 82)

(SX AR-N 8250.03,  SX AR-N 8250.06,  SX AR-N 8250.18)

Experimental sample/custom-made product

Characterisation

  • high-resolution e-beam resist, also sensitive in EUV (13.5 nm) and DUV (250 nm) range
  • comparable to HSQ, but with by a factor of 20 higher sensitivity, easier to remove
  • considerably higher shelf life
  • silsesquioxane and acid generator dissolved in 1-methoxy-2-propanol

Interesting Resist Wiki articles

Properties

  • Film thickness/4000 rpm:  50 nm
  • Resolution best value:       15 nm
  • Contrast:                               8
  • Flash point:                         38 °C
  • Storage 6 month:              8-12 °C

Available order sizes

  • 1x 30 ml (experimental sample)
  • 1 x 100 ml
  • 1 x 250 ml
  • 1 x 1000 ml

Please contact us for further requests.

Suitable process chemicals

Developer AR 300-44

For the development of photoresists and novolac-based e-beam resist films

Thinner AR 600-07

For adjusting the film thickness of photoresists and e-beam resists

Resist structures

Medusa 82 UV structure with higher sensitivity

Medusa product presentation

    Product Request

    *Name

    *Company/Institute

    *E-Mail

    *Subject

    *Your Message