AR-N 2200 series
Products on demand
(AR-N 2210, AR-N 2220)
Ready-to-use negative spray resists for various applications
Please contact us for further requests.
Characterisation
- broadband UV, i-line, g-line
- AR-N 2210 for a uniform coverage of vertical trenches
- AR-N 2220 for etch profiles with 54° slopes
- good adhesion, smooth surface
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA as well as methyl ethyl ketone
Interesting Resist Wiki articles
Properties
AR-N 2210
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Film thickness: 4-10 µm
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Resolution: 1.0 µm
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Contrast: 3
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Flash point: 12 °C
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Storage temperature: 10-18 °C
AR-N 2220
* The products have a guaranteed shelf life of 6 months from the date of sale when stored according to instructions and can be used beyond that without guarantee until the label date.
Available order sizes
- Product on request
Suitable process chemicals
Structure resolution
AR-N 2210: Film thickness 5 μm, Resolution up to 1.4 μm
Process parameters
- SubstrateSi 6“ Wafer
- Tempering82 °C, Chuck
- ExposureBreitband (h-, g-, i-line)
- DevelopmentAR 300-44, 4 min Puddle
Resist structures
AR-N 2220: 5 μm resist structures in 150 μm deep etch grooves
