Photoresist AR-N 2220
Ready-to-use positive and negative spray resists for various applications
Please contact us for further requests.
Characterisation
- broadband UV, i-line, g-line
- negative resist for a uniform coverage of vertical trenches
- for etch profiles with 54° slopes
- good adhesion, smooth surface
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA as well as methyl ethyl ketone
Interesting Resist Wiki articles
Properties
- Film thickness (μm)3-8 µm
- Resolution (μm)1,0 µm
- Contrast3,0
- Flash point (°C)9 °C
- Storage 6 month (°C)10-18 °C
Available order sizes
- 1 x 100 ml (experimental sample)
- 1 x 250 ml
- 2 x 250 ml
- 1 x 1.000 ml
- 6 x 1.000 ml
- 1 x 2.500 ml
- 4 x 2.500 ml
Structure resolution
5 μm resist structures of AR-N 2220 in 150 μm deep etch grooves
Suitable process chemicals
Science poster
