temperature-stable up to 220 °C after subsequent treatment
novolac with photochemical acid generator and amine-based crosslinking agent
Safer solvent PGMEA
Interesting Resist Wiki articles
Film thickness/4000 rpm (μm)
Flash point (°C)
Storage 6 month (°C)
10 - 18 °C
Available order sizes
1 x 100 ml (experimental sample)
1 x 250 ml
1 x 1.000 ml
6 x 1.000 ml
Please contact us for further requests.
Suitable process chemicals
Film thickness 1.4 μm Resist structure 0.7 μm L/S
Si 4" Wafer
85 °C, 60 s, hot plate
i-line Stepper (NA: 0,65)
AR 300-475, 60 s, 22 °C
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
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