AR-P 1220
Ready-to-use positive and negative spray resists for various applications
Please contact us for further requests.
Characterisation
- broadband UV, i-line, g-line
- for a uniform coverage of vertical trenches
- for etch profiles with 54° slopes
- good adhesion, smooth surface
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA as well as methyl ethyl ketone
Interesting Resist Wiki articles
Properties
- Film thickness (μm)3-8 µm
- Resolution (μm)1,0 µm
- Contrast3,0
- Flash point (°C)9 °C
- Storage 6 month (°C)10-18 °C
Verfügbare Bestellgrößen
- Product on request
Suitable process chemicals
Structure resolution
Aluminium conductor paths after etching