AR-P 1230
Ready-to-use positive and negative spray resists for various applications
Please contact us for further requests.
Characterisation
- broadband UV, i-line, g-line
- positive resists for a uniform coverage of vertical trenches
- for planar wafers
- good adhesion, smooth surface
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA as well as methyl ethyl ketone
Interesting Resist Wiki articles
Properties
- Film thickness (μm)0,5-1 µm
- Resolution (μm)1,0 µm
- Contrast3,0
- Flash point (°C)37 °C
- Storage 6 month (°C)10-18 °C
Available order sizes
- Product on request
Suitable process chemicals
Resiststrukturen
Aluminium conductor paths after etching