positive resists for a uniform coverage of vertical trenches
for planar wafers
good adhesion, smooth surface
combination of novolac and naphthoquinone diazide
safer solvent PGMEA as well as methyl ethyl ketone
Interesting Resist Wiki articles
Film thickness (μm)
Flash point (°C)
Storage 6 month (°C)
Available order sizes
Product on request
Please contact us for further requests.
Suitable process chemicals
Aluminium conductor paths after etching
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