AR-P 3110
Product on demand
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Product on demand
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
Please contact us for further requests.
Film thickness 0.6 μm Resist structures 0.38 μm L/S
Up to a structure width of 0.38, a very good agreement is obtained. REM measurement: Thickness 560 nm, i-line stepper (NA: 0.65 NA), Developer AR 300-47 1 : 1.