Protective Coatings AR-PC 504

Wafer backside protection during front side etchings for the production of deep structures in silicon

Product information

Your request for this product

Characterisation

not light-sensitive > 300 nm, no yellow light required
protection of wafer backside when etching the front side
offers reliable protection against mechanical damage during handling and transport
temperature-stable up to 250°C
PMMA with different molecular weights, 503 in addition dyed dark
solvent chlorobenzene

Interesting Resist Wiki articles

Properties

Film thickness/4000 rpm (μm)
2,2 µm
Flash point (°C)
28 °C
Storage 6 month (°C)
18 - 25 °C

Available order sizes

1 x 100 ml (experimental sample)
1 x 250 ml
1 x 1.000 ml
6 x 1.000 ml

Please contact us for further requests.

Suitable process chemicals

All 79 /Adhesions Promoter 2 /AR 300-12 29 /AR 300-26 14 /AR 300-35 5 /AR 300-44 6 /AR 300-46 4 /AR 300-47 12 /AR 300-475 1 /AR 300-72 2 /AR 300-73 13 /AR 300-76 39 /AR 300-80 37 /AR 600-01 6 /AR 600-02 6 /AR 600-07 5 /AR 600-09 4 /AR 600-50 1 /AR 600-51 1 /AR 600-546 1 /AR 600-548 1 /AR 600-549 1 /AR 600-55 12 /AR 600-56 12 /AR 600-60 14 /AR 600-61 1 /AR 600-70 4 /AR 600-71 33 /AR-BR 5400 6 /AR-N 2210 4 /AR-N 2220 4 /AR-N 2230 4 /AR-N 4200 7 /AR-N 4300 7 /AR-N 4400 6 /AR-N 4400-25 4 /AR-N 4400-50 4 /AR-N 4450 5 /AR-N 4600 2 /AR-N 7400 7 /AR-N 7500 6 /AR-N 7520 7 /AR-N 7520 neu 7 /AR-N 7700 7 /AR-N 7720 6 /AR-P 1200 5 /AR-P 3100 7 /AR-P 3200 6 /AR-P 3500 8 /AR-P 3500T 8 /AR-P 3700 7 /AR-P 3800 6 /AR-P 5300 6 /AR-P 5900 6 /AR-P 617 8 /AR-P 6200 9 /AR-P 631-671 7 /AR-P 632-672 8 /AR-P 639-679 8 /AR-P 6500 6 /AR-P 8100 3 /AR-PC 500 4 /AR-PC 5000 3 /AR-U 4000 7 /Bottom Resist 2 /Developer 12 /E-Beam Resist 0 /Negative 7 /Negative 9 /Photoresist 0 /Positive 15 /Positive 17 /Process Chemicals 0 /product group 0 /Products 0 /Protective Resist 5 /Remover 5 /Stopper 1 /SX AR-N 4340/7 6 /SX AR-N 7530/1 5 /SX AR-N 7730/1 5 /SX AR-N 8200/1 2 /SX AR-P 3500/6 5 /SX AR-P 3500/8 5 /SX AR-P 3740/4 5 /SX AR-PC 5000/41 3 /SX AR-PC 5000/80.2 3 /SX AR-PC 5000/82.7 6 /Thinner 4 /X AR-N 7700/30 5 /X AR-P 3220/7 6 /X AR-P 5900/4 4

Adhesion Promoter AR 300-80 new

For improving the adhesive strength of photo and e-beam resists

Bottom Resist AR-BR 5460

Positive or negative system for optically transparent and thermally resistant structures

Bottom Resist AR-BR 5480

Positive or negative system for optically transparent and thermally resistant structures

Developer AR 300-26

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-35

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-44

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-46

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-47

For the development of photoresists and novolac-based e-beam resist films

Developer AR 300-475

For the development of photoresists and novolac-based e-beam resist films

Developer AR 600-50

For the development of e-beam resists films

Developer AR 600-546

For the development of e-beam resists films

Developer AR 600-548

For the development of e-beam resists films

Developer AR 600-549

For the development of e-beam resists films

Developer AR 600-55

For the development of e-beam resists films

Developer AR 600-56

For the development of e-beam resists films

E-Beam Resist AR-N 7500 series

High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C

E-Beam Resist AR-N 7520 new series

Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C

E-Beam Resist AR-N 7520 series

High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C

E-Beam Resist AR-N 7700 series

High-resolution e-beam resists for the production of integrated circuits

E-Beam Resist AR-N 7720 series

AR-N 7720 e-beam resists with flat gradation High-resolution e-beam resists for the production of diffractive optics

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 6510 series

Thick positive resists for the production of microcomponents

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 8100 series (Phoenix 81)

High-contrast, thermolabile resist for integrated circuits and holographic structures

E-Beam Resist SX AR-N 8200 series (Medusa 82)

Experimental sample/custom-made product

E-Beam Resist SX AR-N 8250 series (Medusa 82)

Experimental sample/custom-made product

HMDS adhesion promoter

For improving the adhesive strength of photo and e-beam resists

Photoresist AR-N 2210

Ready-to-use positive and negative spray resists for various applications

Photoresist AR-N 2220

Ready-to-use positive and negative spray resists for various applications

Photoresist AR-N 4340 (CAR)

Highly sensitive negative resist for the production of integrated circuits

Photoresist AR-N 4400-05 (CAR 44)

Thick negative resists for electroplating, microsystems technology and LIGA ≤ 20 μm

Photoresist AR-N 4400-10 (CAR 44)

Thick negative resists for electroplating, microsystems technology and LIGA ≤ 20 μm

Photoresist AR-N 4400-25 (CAR 44)

Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm

Photoresist AR-N 4400-50 (CAR 44)

Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm

Photoresist AR-N 4450-10 T (CAR 44)

Thick negative resists for electroplating, microsystems technology and LIGA ≥ 50 μm

Photoresist AR-N 4600 series (Atlas 46)

Thick negative resists for electroplating, microsystems technologies and LIGA < 20 μm

Photoresist AR-P 1210

Ready-to-use positive and negative spray resists for various applications

Photoresist AR-P 1220

Ready-to-use positive and negative spray resists for various applications

Photoresist AR-P 1230

Ready-to-use positive and negative spray resists for various applications

Photoresist AR-P 3110

Adhesion-enhanced positive resists for the production of masks and fine scale divisions

Photoresist AR-P 3120

Adhesion-enhanced positive resists for the production of masks and fine scale divisions

Photoresist AR-P 3170

Adhesion-enhanced positive resists for the production of masks and fine scale divisions

Photoresist AR-P 3210

Thick positive resists for electroplating and microsystems technology

Photoresist AR-P 3220

Thick positive resists for electroplating and microsystems technology

Photoresist AR-P 3250

Thick positive resists for electroplating and microsystems technology

Photoresist AR-P 3510

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3510 T

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3540

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3540 T

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3740

Sensitive positive-tone standard resists for the production of highly integrated circuits

Photoresist AR-P 5320

Sensitive positive-tone resists for the production of evaporation samples

Photoresist AR-P 5350

Sensitive positive-tone resists for the production of evaporation samples

Photoresist SX AR-P 3500/8

Positive photoresist for high-temperature application up to 300 °C

Protective Coating AR-PC 5040

Wafer backside protection during front side etchings for the production of deep structures in silicon

Protective Coating AR-PC 5090.02 (Electra 92)

Conductive protective coating for non-novolak-based e-beam resists Top layer for the dissipation of e-beam charges on insulating substrates

Protective Coating AR-PC 5091.02 (Electra 92)

Top layer for the dissipation of e-beam charges on insulating substrates

Protective Coating SX AR-PC 5000/41

KOH and HF resistant protective coating for wafer backside protection

Protective Coatings AR-PC 504

Wafer backside protection during front side etchings for the production of deep structures in silicon

Remover AR 300-70

For the stripping of tempered photoresist and e-beam resist films

Remover AR 300-72

For the stripping of tempered photoresist and e-beam resist films

Remover AR 300-73

For the stripping of tempered photoresist and e-beam resist films

Remover AR 300-76

For the stripping of tempered photoresist and e-beam resist films

Remover AR 600-71

For the stripping of tempered photoresist and e-beam resist films

Stopper AR 600-60

For the stopping of e-beam resist film development with solvents

Thinner AR 300-12

For adjusting the film thickness of photoresists and e-beam resists

Thinner AR 600-02

For adjusting the film thickness of photoresists and e-beam resists

Thinner AR 600-07

For adjusting the film thickness of photoresists and e-beam resists

Thinner AR 600-09

For adjusting the film thickness of photoresists and e-beam resists

Photo of coated wafer

Protective coating AR-P 504 covering sensitive structures

Spin curve