Protective Coatings AR-PC 504
Wafer backside protection during front side etchings for the production of deep structures in silicon
Please contact us for further requests.
Characterisation
- not light-sensitive > 300 nm, no yellow light required
- protection of wafer backside when etching the front side
- offers reliable protection against mechanical damage during handling and transport
- temperature-stable up to 250°C
- PMMA with different molecular weights, 503 in addition dyed dark
- solvent chlorobenzene
Interesting Resist Wiki articles
Properties
- Film thickness/4000 rpm (μm)2,2 µm
- Flash point (°C)28 °C
- Storage 6 month (°C)18 - 25 °C
Available order sizes
- 1 x 100 ml (experimental sample)
- 1 x 250 ml
- 1 x 1 L
- 6 x 1 L
Suitable process chemicals
Photo of coated wafer
Protective coating AR-P 504 covering sensitive structures
Spin curve
