Protective Coating Electra 92 (AR-PC 5090)
Conductive protective coating for non-novolak-based e-beam resists
Top layer for the dissipation of e-beam charges on insulating substrates
Characterisation
- as protective coating, this resist is not sensitive to light / radiation
- thin, conductive layers for the dissipation of charges during electron exposure
- coating of non-novolac PMMA, CSAR 62, et al.
- longterm-stable
- easy removal with water after exposure
- polyaniline-derivative dissolved in water and IPA
Properties
- Film thickness/4000 rpm (nm)42 nm
- Film thickness/1000 rpm (nm)100 nm
- Resolution (μm)1,2 S/m
- Flash point (°C)28 °C
- Storage 6 month (°C)8-12 °C
* The products have a guaranteed shelf life of 6 months from the date of sale when stored according to instructions and can be used beyond that without guarantee until the label date.
Suitable process chemicals
- RemoverDI-Wasser
REM dissipation of charges
200 nm-squares written on quartz without distortion caused by charges with AR-P 662.04 and AR-PC 5090.02
Process parameters
- Substrate4“ Quarz-Wafer mit AR-P 662.04
- Coating2000 rpm, 60 nm auf E-Beamresist
- Tempering85 °C
Conductivity
After a few hours of air humidity absorption under room conditions, the conductivity decreases again to the initial value. In the high vacuum the conductivity thus increases accordingly. This effect has been demonstrated in direct conductivity measurements under mediate vacuum conditions. Temperatures above 165 °C destroy the polyaniline irreversibly and no conductivity is observed any more.
Available order sizes
- 1 x 30 ml (experimental sample)
- 1 x 100 ml (experimental sample)
- 1 x 250 ml
- 1 x 1 L
- 6 x 1 L
CSAR 62 on glass + Electra 92
Abb.: 30 –150 nm squares of the CSAR 62 on glass
The combination of CSAR 62 with AR-PC 5090.02 offers the best possibilities for carrying out complicated e-beam structuring on glass, quartz or semi-insulating substrates such as gallium arsenide. The excellent sensitivity and high resolution of the CSAR are harmoniously complemented by the conductivity of the Electra.
PMMA lift-off on glass with Electra 92
200 nm squares produced with 2-layer PMMA lift-off
Initially, the PMMA resist AR-P 669.04 (200 nm thickness) was coated on a quartz substrate and tempered. The second PMMA resist AR-P 679.03 was then applied (150 nm thickness) and tempered, followed by coating with Electra 92. After exposure, Electra 92 was removed with water, the PMMA structures were developed (AR 600-56) and the substrate vaporised with titanium/gold. After a liftoff with acetone, the desired squares remained on the glass
with high precision.
Science poster MNE 2016
